John M. Whittey
John M. Whittey publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Mechanical Engineering, on topics such as Advancements in Photolithography Techniques, Advanced Measurement and Metrology Techniques and Electron and X-Ray Spectroscopy Techniques.
- World rank
- #6,840,801 of 7,710,434 ranked researchers
- Rank in Germany
- #338,437 of 364,343
- Works
- 16
- Citations
- 33
- Citations per work
- 2.1
What does John M. Whittey research?
John M. Whittey's work is mostly in Engineering (73%), Materials Science (16%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1488.9%
- Engineering1273.3%
- Materials Science215.6%
- Everything else211.1%
- 1Electrical and Electronic Engineering38% of their works
- 2Surfaces, Coatings and Films16% of their works
- 3Mechanical Engineering13% of their works
- 4Biomedical Engineering11% of their works
- 5Industrial and Manufacturing Engineering7% of their works
- 6Computational Mechanics4% of their works
Research topics
- Advancements in Photolithography Techniques
- Advanced Measurement and Metrology Techniques
- Electron and X-Ray Spectroscopy Techniques
- Advanced Surface Polishing Techniques
- Industrial Vision Systems and Defect Detection
- Surface Roughness and Optical Measurements
- Optical Coatings and Gratings
- Sensor Technology and Measurement Systems
Which keywords describe John M. Whittey's research?
The keywords of their largest research topics: Nanofabrication, Electron Beam Lithography, Resolution Limits, Dimensional Metrology, Error Compensation, Machine Vision, Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy.
- Smart Sensors
- Surface Characterization
- Nanostructures
- Texture Analysis
- Fabric Defect Detection
- X-ray Photoelectron Spectroscopy
- Machine Vision
- Dimensional Metrology
- Electron Beam Lithography
- Nanofabrication
- Resolution Limits
- Error Compensation
- Scanning Electron Microscopy
- Chemical Mechanical Planarization
- Material Removal Mechanism
- Antireflective Coatings
- Roughness Measurement
- IEEE 1451
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 18 words, with their numbers
- Nanofabrication172 topics
- Electron Beam Lithography151 topic
- Resolution Limits151 topic
- Dimensional Metrology51 topic
- Error Compensation51 topic
- Machine Vision52 topics
- Scanning Electron Microscopy51 topic
- X-ray Photoelectron Spectroscopy51 topic
- Chemical Mechanical Planarization31 topic
- Fabric Defect Detection31 topic
- Material Removal Mechanism31 topic
- Texture Analysis31 topic
- Antireflective Coatings21 topic
- Nanostructures21 topic
- Roughness Measurement21 topic
- Surface Characterization21 topic
- IEEE 145111 topic
- Smart Sensors11 topic
Where does John M. Whittey work?
John M. Whittey's main affiliation in the publication record is Vistec Electron Beam (Germany), Germany.
How many publications and citations does John M. Whittey have?
OpenAlex counts 16 works and 33 citations for John M. Whittey, an h-index of 4, ranking #6,840,801 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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