Konstantin Karavaev
Konstantin Karavaev publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics, on topics such as Semiconductor materials and devices, Integrated Circuits and Semiconductor Failure Analysis and Electron and X-Ray Spectroscopy Techniques.
- World rank
- #7,019,511 of 7,710,434 ranked researchers
- Rank in Germany
- #344,016 of 364,343
- Works
- 23
- Citations
- 106
- Citations per work
- 4.6
What does Konstantin Karavaev research?
Konstantin Karavaev's work is mostly in Engineering (47%), Materials Science (27%), Physics and Astronomy (9%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1982.9%
- Engineering1146.9%
- Materials Science626.6%
- Physics and Astronomy29.4%
- Everything else417.1%
- 1Electrical and Electronic Engineering42% of their works
- 2Materials Chemistry11% of their works
- 3Atomic and Molecular Physics, and Optics9% of their works
- 4Surfaces, Coatings and Films9% of their works
- 5Electronic, Optical and Magnetic Materials6% of their works
- 6Biomedical Engineering5% of their works
Research topics
- Semiconductor materials and devices
- Integrated Circuits and Semiconductor Failure Analysis
- Electron and X-Ray Spectroscopy Techniques
- Copper Interconnects and Reliability
- Electronic and Structural Properties of Oxides
- Catalytic Processes in Materials Science
- Force Microscopy Techniques and Applications
- Semiconductor materials and interfaces
Which keywords describe Konstantin Karavaev's research?
The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Failure Analysis, Integrated Circuits, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Low-k Dielectrics and Microelectronics.
- Schottky Barrier
- Metal-Semiconductor Contacts
- Catalysis
- Two-Dimensional Electron Gases
- Microelectronics
- X-ray Photoelectron Spectroscopy
- Integrated Circuits
- High-k Dielectrics
- Atomic Layer Deposition
- Failure Analysis
- Scanning Electron Microscopy
- Low-k Dielectrics
- Oxide Interfaces
- Atomic Force Microscopy
- Force Spectroscopy
- Nanoparticles
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 16 words, with their numbers
- Atomic Layer Deposition181 topic
- High-k Dielectrics181 topic
- Failure Analysis61 topic
- Integrated Circuits61 topic
- Scanning Electron Microscopy61 topic
- X-ray Photoelectron Spectroscopy61 topic
- Low-k Dielectrics41 topic
- Microelectronics41 topic
- Oxide Interfaces41 topic
- Two-Dimensional Electron Gases41 topic
- Atomic Force Microscopy31 topic
- Catalysis31 topic
- Force Spectroscopy31 topic
- Metal-Semiconductor Contacts31 topic
- Nanoparticles31 topic
- Schottky Barrier31 topic
Where does Konstantin Karavaev work?
Konstantin Karavaev's main affiliation in the publication record is Brandenburg University of Technology Cottbus-Senftenberg, Germany.
How many publications and citations does Konstantin Karavaev have?
OpenAlex counts 23 works and 106 citations for Konstantin Karavaev, an h-index of 7, ranking #7,019,511 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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