M. Yoshimi
M. Yoshimi publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films, on topics such as Advancements in Semiconductor Devices and Circuit Design, Integrated Circuits and Semiconductor Failure Analysis and Semiconductor materials and devices.
- World rank
- #301,048 of 1,633,909 ranked researchers
- Rank in Japan
- #9,249 of 114,622
- Works
- 22
- Citations
- 109
- Citations per work
- 5.0
What does M. Yoshimi research?
Shares of their own output, by the field each of their topics belongs to. The grey slice is everything not listed.
- 1Electrical and Electronic Engineering82% of their works
- 2Biomedical Engineering7% of their works
- 3Surfaces, Coatings and Films4% of their works
- 4Atomic and Molecular Physics, and Optics4% of their works
- 5Materials Chemistry4% of their works
Research topics
- Advancements in Semiconductor Devices and Circuit Design
- Integrated Circuits and Semiconductor Failure Analysis
- Semiconductor materials and devices
- Advanced Surface Polishing Techniques
- Silicon and Solar Cell Technologies
- Silicon Carbide Semiconductor Technologies
- Low-power high-performance VLSI design
- Advancements in Photolithography Techniques
Which keywords describe M. Yoshimi's research?
The keywords of their largest research topics: Process Variation, Nanowire Transistors, Tunnel Field-Effect Transistors, Failure Analysis, Integrated Circuits, Atomic Layer Deposition, High-k Dielectrics and Chemical Mechanical Planarization.
- VLSI Circuits
- Silicon
- Nanofabrication
- Electron Beam Lithography
- Chemical Mechanical Planarization
- Atomic Layer Deposition
- Failure Analysis
- Nanowire Transistors
- Process Variation
- Tunnel Field-Effect Transistors
- Integrated Circuits
- High-k Dielectrics
- Material Removal Mechanism
- Low-Power
- Reliability
- Solar Cells
- Wide Bandgap Semiconductors
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- Process Variation82 topics
- Nanowire Transistors71 topic
- Tunnel Field-Effect Transistors71 topic
- Failure Analysis51 topic
- Integrated Circuits51 topic
- Atomic Layer Deposition41 topic
- High-k Dielectrics41 topic
- Chemical Mechanical Planarization21 topic
- Material Removal Mechanism21 topic
- Electron Beam Lithography11 topic
- Low-Power11 topic
- Nanofabrication11 topic
- Reliability11 topic
- Silicon11 topic
- Solar Cells11 topic
- VLSI Circuits11 topic
- Wide Bandgap Semiconductors11 topic
Where does M. Yoshimi work?
M. Yoshimi's main affiliation in the publication record is Toshiba (Japan), Japan.
How many publications and citations does M. Yoshimi have?
Science Explorer counts 22 works and 109 citations for M. Yoshimi, ranking #301,048 of 1,633,909 researchers worldwide on the composite score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics are in the interactive view on the map. Is this your page? Request a correction or removal.