Mario Hennig
Mario Hennig publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Industrial and Manufacturing Engineering, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Industrial Vision Systems and Defect Detection.
- World rank
- #7,093,093 of 7,710,434 ranked researchers
- Rank in Germany
- #346,194 of 364,343
- Works
- 20
- Citations
- 44
- Citations per work
- 2.2
What does Mario Hennig research?
Mario Hennig's work is mostly in Engineering (82%), Materials Science (8%), Biochemistry, Genetics and Molecular Biology (3%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1890.0%
- Engineering1681.7%
- Materials Science28.3%
- Everything else16.7%
- Life Sciences13.3%
- 1Electrical and Electronic Engineering55% of their works
- 2Biomedical Engineering12% of their works
- 3Industrial and Manufacturing Engineering10% of their works
- 4Surfaces, Coatings and Films8% of their works
- 5Computational Mechanics5% of their works
- 6Molecular Biology3% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Industrial Vision Systems and Defect Detection
- Advanced Surface Polishing Techniques
- Surface Roughness and Optical Measurements
- Optical Coatings and Gratings
- Advanced optical system design
- Electron and X-Ray Spectroscopy Techniques
Which keywords describe Mario Hennig's research?
The keywords of their largest research topics: Nanofabrication, Electron Beam Lithography, Resolution Limits, Failure Analysis, Integrated Circuits, Machine Vision, Fabric Defect Detection and Texture Analysis.
- X-ray Photoelectron Spectroscopy
- Freeform Optics
- Surface Characterization
- Nanostructures
- Material Removal Mechanism
- Texture Analysis
- Machine Vision
- Failure Analysis
- Electron Beam Lithography
- Nanofabrication
- Resolution Limits
- Integrated Circuits
- Fabric Defect Detection
- Chemical Mechanical Planarization
- Antireflective Coatings
- Roughness Measurement
- Compound Eyes
- Scanning Electron Microscopy
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 18 words, with their numbers
- Nanofabrication222 topics
- Electron Beam Lithography191 topic
- Resolution Limits191 topic
- Failure Analysis121 topic
- Integrated Circuits121 topic
- Machine Vision92 topics
- Fabric Defect Detection61 topic
- Texture Analysis61 topic
- Chemical Mechanical Planarization41 topic
- Material Removal Mechanism41 topic
- Antireflective Coatings31 topic
- Nanostructures31 topic
- Roughness Measurement31 topic
- Surface Characterization31 topic
- Compound Eyes21 topic
- Freeform Optics21 topic
- Scanning Electron Microscopy21 topic
- X-ray Photoelectron Spectroscopy21 topic
Where does Mario Hennig work?
Mario Hennig's main affiliation in the publication record is Infineon Technologies (Germany), Germany.
How many publications and citations does Mario Hennig have?
OpenAlex counts 20 works and 44 citations for Mario Hennig, an h-index of 4, ranking #7,093,093 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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