Mark Klare
Mark Klare publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering, on topics such as Electron and X-Ray Spectroscopy Techniques, Semiconductor materials and devices and Integrated Circuits and Semiconductor Failure Analysis.
- World rank
- #6,392,214 of 7,710,434 ranked researchers
- Rank in United States
- #1,512,397 of 1,627,098
- Works
- 18
- Citations
- 90
- Citations per work
- 5.0
What does Mark Klare research?
Mark Klare's work is mostly in Engineering (60%), Materials Science (27%), Biochemistry, Genetics and Molecular Biology (2%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1686.5%
- Engineering1159.6%
- Materials Science526.9%
- Everything else211.6%
- Life Sciences01.9%
- 1Electrical and Electronic Engineering48% of their works
- 2Surfaces, Coatings and Films23% of their works
- 3Biomedical Engineering8% of their works
- 4Materials Chemistry4% of their works
- 5Computational Mechanics4% of their works
- 6Structural Biology2% of their works
Research topics
- Electron and X-Ray Spectroscopy Techniques
- Semiconductor materials and devices
- Integrated Circuits and Semiconductor Failure Analysis
- Advancements in Photolithography Techniques
- Advancements in Semiconductor Devices and Circuit Design
- Optical Coatings and Gratings
- Advanced Surface Polishing Techniques
- Surface Roughness and Optical Measurements
Which keywords describe Mark Klare's research?
The keywords of their largest research topics: Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Atomic Layer Deposition, High-k Dielectrics, Nanofabrication, Failure Analysis, Integrated Circuits and Electron Beam Lithography.
- Roughness Measurement
- Chemical Mechanical Planarization
- Nanowire Transistors
- Antireflective Coatings
- Electron Beam Lithography
- Failure Analysis
- High-k Dielectrics
- X-ray Photoelectron Spectroscopy
- Scanning Electron Microscopy
- Atomic Layer Deposition
- Nanofabrication
- Integrated Circuits
- Resolution Limits
- Nanostructures
- Tunnel Field-Effect Transistors
- Material Removal Mechanism
- Surface Characterization
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- Scanning Electron Microscopy91 topic
- X-ray Photoelectron Spectroscopy91 topic
- Atomic Layer Deposition71 topic
- High-k Dielectrics71 topic
- Nanofabrication72 topics
- Failure Analysis61 topic
- Integrated Circuits61 topic
- Electron Beam Lithography41 topic
- Resolution Limits41 topic
- Antireflective Coatings31 topic
- Nanostructures31 topic
- Nanowire Transistors31 topic
- Tunnel Field-Effect Transistors31 topic
- Chemical Mechanical Planarization21 topic
- Material Removal Mechanism21 topic
- Roughness Measurement21 topic
- Surface Characterization21 topic
Where does Mark Klare work?
Mark Klare's main affiliation in the publication record is GlobalFoundries (United States), United States.
How many publications and citations does Mark Klare have?
OpenAlex counts 18 works and 90 citations for Mark Klare, an h-index of 5, ranking #6,392,214 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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