Martin J. J. Jak
Martin J. J. Jak publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics, on topics such as Advancements in Photolithography Techniques, Optical Coatings and Gratings and Advanced Surface Polishing Techniques.
- World rank
- #5,892,511 of 7,710,434 ranked researchers
- Rank in Netherlands
- #97,649 of 107,149
- Works
- 21
- Citations
- 444
- Citations per work
- 21.1
What does Martin J. J. Jak research?
Martin J. J. Jak's work is mostly in Engineering (51%), Materials Science (22%), Physics and Astronomy (14%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1887.2%
- Engineering1150.7%
- Materials Science522.2%
- Physics and Astronomy314.3%
- Everything else312.8%
- 1Electrical and Electronic Engineering32% of their works
- 2Surfaces, Coatings and Films14% of their works
- 3Atomic and Molecular Physics, and Optics14% of their works
- 4Biomedical Engineering11% of their works
- 5Computational Mechanics8% of their works
- 6Materials Chemistry8% of their works
Research topics
- Advancements in Photolithography Techniques
- Optical Coatings and Gratings
- Advanced Surface Polishing Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- nanoparticles nucleation surface interactions
- Photonic Crystals and Applications
- Advanced optical system design
- Ion-surface interactions and analysis
Which keywords describe Martin J. J. Jak's research?
The keywords of their largest research topics: Nanofabrication, Photonic Crystals, Nanostructures, Electron Beam Lithography, Resolution Limits, Antireflective Coatings, Molecular Dynamics Simulation and Thin-Film Materials.
- Surface Analysis
- Freeform Optics
- Slow Light
- Melting
- Material Removal Mechanism
- Failure Analysis
- Thin-Film Materials
- Antireflective Coatings
- Electron Beam Lithography
- Photonic Crystals
- Nanofabrication
- Nanostructures
- Resolution Limits
- Molecular Dynamics Simulation
- Chemical Mechanical Planarization
- Integrated Circuits
- Ice Nucleation
- Nanocavities
- Compound Eyes
- Ion Beam
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 20 words, with their numbers
- Nanofabrication152 topics
- Photonic Crystals102 topics
- Nanostructures92 topics
- Electron Beam Lithography81 topic
- Resolution Limits81 topic
- Antireflective Coatings71 topic
- Molecular Dynamics Simulation72 topics
- Thin-Film Materials71 topic
- Chemical Mechanical Planarization41 topic
- Failure Analysis41 topic
- Integrated Circuits41 topic
- Material Removal Mechanism41 topic
- Ice Nucleation31 topic
- Melting31 topic
- Nanocavities31 topic
- Slow Light31 topic
- Compound Eyes21 topic
- Freeform Optics21 topic
- Ion Beam21 topic
- Surface Analysis21 topic
Where does Martin J. J. Jak work?
Martin J. J. Jak's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does Martin J. J. Jak have?
OpenAlex counts 21 works and 444 citations for Martin J. J. Jak, an h-index of 12, ranking #5,892,511 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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