Shih-En Tseng
Shih-En Tseng publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Electron and X-Ray Spectroscopy Techniques.
- World rank
- #6,704,062 of 7,710,434 ranked researchers
- Rank in Netherlands
- #103,223 of 107,149
- Works
- 16
- Citations
- 25
- Citations per work
- 1.6
What does Shih-En Tseng research?
Shih-En Tseng's work is mostly in Engineering (66%), Materials Science (19%), Computer Science (2%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1487.2%
- Engineering1166.0%
- Materials Science319.1%
- Computer Science02.1%
- Everything else212.8%
- 1Electrical and Electronic Engineering55% of their works
- 2Surfaces, Coatings and Films19% of their works
- 3Biomedical Engineering4% of their works
- 4Control and Systems Engineering4% of their works
- 5Computer Vision and Pattern Recognition2% of their works
- 6Mechanical Engineering2% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Electron and X-Ray Spectroscopy Techniques
- Advanced Surface Polishing Techniques
- Optical Coatings and Gratings
- Advanced Data Storage Technologies
- Optical measurement and interference techniques
- Advanced Numerical Analysis Techniques
Which keywords describe Shih-En Tseng's research?
The keywords of their largest research topics: Nanofabrication, Electron Beam Lithography, Resolution Limits, Failure Analysis, Integrated Circuits, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy and Antireflective Coatings.
- Network Coding
- Finite Elements
- Camera Calibration
- Material Removal Mechanism
- Antireflective Coatings
- Scanning Electron Microscopy
- Failure Analysis
- Electron Beam Lithography
- Nanofabrication
- Resolution Limits
- Integrated Circuits
- X-ray Photoelectron Spectroscopy
- Chemical Mechanical Planarization
- Nanostructures
- Distributed Storage
- NURBS
- Structured Light
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 17 words, with their numbers
- Nanofabrication162 topics
- Electron Beam Lithography141 topic
- Resolution Limits141 topic
- Failure Analysis81 topic
- Integrated Circuits81 topic
- Scanning Electron Microscopy71 topic
- X-ray Photoelectron Spectroscopy71 topic
- Antireflective Coatings21 topic
- Chemical Mechanical Planarization21 topic
- Material Removal Mechanism21 topic
- Nanostructures21 topic
- Camera Calibration11 topic
- Distributed Storage11 topic
- Finite Elements11 topic
- NURBS11 topic
- Network Coding11 topic
- Structured Light11 topic
Where does Shih-En Tseng work?
Shih-En Tseng's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does Shih-En Tseng have?
OpenAlex counts 16 works and 25 citations for Shih-En Tseng, an h-index of 3, ranking #6,704,062 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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