Stanley Woolf
Stanley Woolf publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Radiation, on topics such as Electron and X-Ray Spectroscopy Techniques, Semiconductor materials and devices and Radiation Effects in Electronics.
- World rank
- #7,389,367 of 7,710,434 ranked researchers
- Rank in United States
- #1,605,500 of 1,627,098
- Works
- 55
- Citations
- 319
- Citations per work
- 5.8
What does Stanley Woolf research?
Stanley Woolf's work is mostly in Engineering (27%), Materials Science (23%), Physics and Astronomy (20%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3970.7%
- Engineering1527.3%
- Materials Science1323.1%
- Physics and Astronomy1120.3%
- Everything else1629.3%
- 1Electrical and Electronic Engineering27% of their works
- 2Surfaces, Coatings and Films13% of their works
- 3Radiation12% of their works
- 4Materials Chemistry10% of their works
- 5Atomic and Molecular Physics, and Optics5% of their works
- 6Astronomy and Astrophysics4% of their works
Research topics
- Electron and X-Ray Spectroscopy Techniques
- Semiconductor materials and devices
- Radiation Effects in Electronics
- Integrated Circuits and Semiconductor Failure Analysis
- Radiation Detection and Scintillator Technologies
- Graphite, nuclear technology, radiation studies
- Nuclear Physics and Applications
- Nuclear reactor physics and engineering
Which keywords describe Stanley Woolf's research?
The keywords of their largest research topics: Nanoelectronics, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Atomic Layer Deposition, High-k Dielectrics, Radiation Effects, Soft Errors and Failure Analysis.
- Molten Salt
- Neutron Imaging
- Nuclear Graphite
- Integrated Circuits
- Failure Analysis
- Radiation Effects
- Atomic Layer Deposition
- Scanning Electron Microscopy
- Nanoelectronics
- X-ray Photoelectron Spectroscopy
- High-k Dielectrics
- Soft Errors
- Inorganic Scintillators
- Scintillation Detectors
- Oxidation Behavior
- Small-Angle Scattering
- Nuclear Reactor
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- Nanoelectronics202 topics
- Scanning Electron Microscopy181 topic
- X-ray Photoelectron Spectroscopy181 topic
- Atomic Layer Deposition111 topic
- High-k Dielectrics111 topic
- Radiation Effects91 topic
- Soft Errors91 topic
- Failure Analysis71 topic
- Inorganic Scintillators71 topic
- Integrated Circuits71 topic
- Scintillation Detectors71 topic
- Nuclear Graphite61 topic
- Oxidation Behavior61 topic
- Neutron Imaging51 topic
- Small-Angle Scattering51 topic
- Molten Salt41 topic
- Nuclear Reactor41 topic
Where does Stanley Woolf work?
Stanley Woolf's main affiliation in the publication record is Arcon (United States), United States.
How many publications and citations does Stanley Woolf have?
OpenAlex counts 55 works and 319 citations for Stanley Woolf, an h-index of 11, ranking #7,389,367 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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