Science Explorer Interactive view Map
Researcher · IBM (United States) · United States

T. Furukawa

T. Furukawa publishes mostly in Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry, on topics such as Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design and Silicon Carbide Semiconductor Technologies.

OpenAlex
World rank
#360,931
of 1,633,909 ranked researchers
Rank in United States
#130,713
of 358,040
Works
15
Citations
137
Citations per work
9.1

What does T. Furukawa research?

Electrical and Electronic Engineering: 75.1%Electronic, Optical and Magnetic Materials: 8.3%Materials Chemistry: 8.3%Atomic and Molecular Physics, and Optics: 8.3%75%top field
Electrical and Electronic Engineering75.0%Electronic, Optical and Magnetic Materials8.3%Materials Chemistry8.3%Atomic and Molecular Physics, and Optics8.3%

Shares of their own output, by the field each of their topics belongs to. The grey slice is everything not listed.

  1. 1Electrical and Electronic Engineering75% of their works
  2. 2Electronic, Optical and Magnetic Materials8% of their works
  3. 3Materials Chemistry8% of their works
  4. 4Atomic and Molecular Physics, and Optics8% of their works

Research topics

Which keywords describe T. Furukawa's research?

The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Nanowire Transistors, Tunnel Field-Effect Transistors, Nanowires, Failure Analysis, Integrated Circuits and Low-k Dielectrics.

Size is their works in the topics tagged with each word, from their 7 largest topics. Each links to the topic it comes from most.

All 15 words, with their numbers
  1. Atomic Layer Deposition41 topic
  2. High-k Dielectrics41 topic
  3. Nanowire Transistors31 topic
  4. Tunnel Field-Effect Transistors31 topic
  5. Nanowires22 topics
  6. Failure Analysis11 topic
  7. Integrated Circuits11 topic
  8. Low-k Dielectrics11 topic
  9. Metal-Semiconductor Contacts11 topic
  10. Microelectronics11 topic
  11. Nanostructures11 topic
  12. Reliability11 topic
  13. Schottky Barrier11 topic
  14. Wide Bandgap Semiconductors11 topic
  15. Zinc Oxide11 topic

Where does T. Furukawa work?

T. Furukawa's main affiliation in the publication record is IBM (United States), United States.

How many publications and citations does T. Furukawa have?

Science Explorer counts 15 works and 137 citations for T. Furukawa, ranking #360,931 of 1,633,909 researchers worldwide on the composite score.

Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Other researchers named T. Furukawa

Papers, co-authors, who cited this work and researchers on the nearest topics are in the interactive view on the map. Is this your page? Request a correction or removal.