Ton Kiers
Ton Kiers publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Industrial and Manufacturing Engineering, on topics such as Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques and Integrated Circuits and Semiconductor Failure Analysis.
- World rank
- #6,878,996 of 7,710,434 ranked researchers
- Rank in Netherlands
- #104,031 of 107,149
- Works
- 18
- Citations
- 107
- Citations per work
- 5.9
What does Ton Kiers research?
Ton Kiers's work is mostly in Engineering (69%), Materials Science (24%), Neuroscience (2%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1793.2%
- Engineering1268.8%
- Materials Science424.4%
- Everything else14.6%
- Life Sciences02.2%
- Neuroscience02.2%
- 1Electrical and Electronic Engineering49% of their works
- 2Surfaces, Coatings and Films24% of their works
- 3Industrial and Manufacturing Engineering11% of their works
- 4Computational Mechanics4% of their works
- 5Biomedical Engineering4% of their works
- 6Cognitive Neuroscience2% of their works
Research topics
- Advancements in Photolithography Techniques
- Electron and X-Ray Spectroscopy Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Industrial Vision Systems and Defect Detection
- Optical Coatings and Gratings
- Advanced Surface Polishing Techniques
- Surface Roughness and Optical Measurements
- Visual perception and processing mechanisms
Which keywords describe Ton Kiers's research?
The keywords of their largest research topics: Nanofabrication, Electron Beam Lithography, Resolution Limits, Machine Vision, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Antireflective Coatings and Fabric Defect Detection.
- Visual Perception
- Surface Characterization
- Material Removal Mechanism
- Texture Analysis
- Integrated Circuits
- Fabric Defect Detection
- X-ray Photoelectron Spectroscopy
- Machine Vision
- Electron Beam Lithography
- Nanofabrication
- Resolution Limits
- Scanning Electron Microscopy
- Antireflective Coatings
- Failure Analysis
- Nanostructures
- Chemical Mechanical Planarization
- Roughness Measurement
- Neural Processing
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 18 words, with their numbers
- Nanofabrication182 topics
- Electron Beam Lithography131 topic
- Resolution Limits131 topic
- Machine Vision72 topics
- Scanning Electron Microscopy61 topic
- X-ray Photoelectron Spectroscopy61 topic
- Antireflective Coatings51 topic
- Fabric Defect Detection51 topic
- Failure Analysis51 topic
- Integrated Circuits51 topic
- Nanostructures51 topic
- Texture Analysis51 topic
- Chemical Mechanical Planarization21 topic
- Material Removal Mechanism21 topic
- Roughness Measurement21 topic
- Surface Characterization21 topic
- Neural Processing11 topic
- Visual Perception11 topic
Where does Ton Kiers work?
Ton Kiers's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does Ton Kiers have?
OpenAlex counts 18 works and 107 citations for Ton Kiers, an h-index of 5, ranking #6,878,996 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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