C. Borowiak
C. Borowiak publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics, on topics such as Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design and Integrated Circuits and Semiconductor Failure Analysis.
- World rank
- #3,977,789 of 7,710,434 ranked researchers
- Rank in France
- #167,469 of 324,115
- Works
- 22
- Citations
- 330
- Citations per work
- 15.0
What does C. Borowiak research?
C. Borowiak's work is mostly in Engineering (92%), Materials Science (4%), Physics and Astronomy (3%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences2299.9%
- Engineering2092.4%
- Materials Science14.5%
- Physics and Astronomy13.0%
- 1Electrical and Electronic Engineering91% of their works
- 2Materials Chemistry3% of their works
- 3Atomic and Molecular Physics, and Optics3% of their works
- 4Electronic, Optical and Magnetic Materials2% of their works
- 5Biomedical Engineering2% of their works
Research topics
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Integrated Circuits and Semiconductor Failure Analysis
- Ferroelectric and Negative Capacitance Devices
- 3D IC and TSV technologies
- Radio Frequency Integrated Circuit Design
- Silicon Carbide Semiconductor Technologies
- Semiconductor materials and interfaces
Which keywords describe C. Borowiak's research?
The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Nanowire Transistors, Tunnel Field-Effect Transistors, Integrated Circuits, Failure Analysis, Photon Emission Microscopy and Thermal Management.
- Wide Bandgap Semiconductors
- Reliability
- Metal-Semiconductor Contacts
- Through-Silicon Via
- Hafnium Oxide
- Thermal Management
- Failure Analysis
- Tunnel Field-Effect Transistors
- High-k Dielectrics
- Atomic Layer Deposition
- Nanowire Transistors
- Integrated Circuits
- Photon Emission Microscopy
- Ferroelectricity
- Interconnect
- CMOS
- Oscillators
- Schottky Barrier
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 18 words, with their numbers
- Atomic Layer Deposition181 topic
- High-k Dielectrics181 topic
- Nanowire Transistors161 topic
- Tunnel Field-Effect Transistors161 topic
- Integrated Circuits122 topics
- Failure Analysis101 topic
- Photon Emission Microscopy101 topic
- Thermal Management52 topics
- Ferroelectricity41 topic
- Hafnium Oxide41 topic
- Interconnect31 topic
- Through-Silicon Via31 topic
- CMOS21 topic
- Metal-Semiconductor Contacts21 topic
- Oscillators21 topic
- Reliability21 topic
- Schottky Barrier21 topic
- Wide Bandgap Semiconductors21 topic
Where does C. Borowiak work?
C. Borowiak's main affiliation in the publication record is STMicroelectronics (France), France.
How many publications and citations does C. Borowiak have?
OpenAlex counts 22 works and 330 citations for C. Borowiak, an h-index of 9, ranking #3,977,789 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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