Clement Huang
Clement Huang publishes mostly in Electrical and Electronic Engineering, Condensed Matter Physics and Atomic and Molecular Physics, and Optics, on topics such as Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design and GaN-based semiconductor devices and materials.
- World rank
- #6,630,675 of 7,710,434 ranked researchers
- Rank in Taiwan
- #50,782 of 57,035
- Works
- 15
- Citations
- 47
- Citations per work
- 3.1
What does Clement Huang research?
Clement Huang's work is mostly in Engineering (69%), Physics and Astronomy (20%), Materials Science (11%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences15100.0%
- Engineering1068.9%
- Physics and Astronomy320.0%
- Materials Science211.1%
- 1Electrical and Electronic Engineering62% of their works
- 2Condensed Matter Physics11% of their works
- 3Atomic and Molecular Physics, and Optics9% of their works
- 4Electronic, Optical and Magnetic Materials9% of their works
- 5Biomedical Engineering7% of their works
- 6Materials Chemistry2% of their works
Research topics
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- GaN-based semiconductor devices and materials
- Radio Frequency Integrated Circuit Design
- Copper Interconnects and Reliability
- Silicon Carbide Semiconductor Technologies
- Semiconductor Quantum Structures and Devices
- Advanced Surface Polishing Techniques
Which keywords describe Clement Huang's research?
The keywords of their largest research topics: Nanowires, Band Parameters, Atomic Layer Deposition, High-k Dielectrics, III-Nitrides, Nanowire Transistors, Semiconductors and Tunnel Field-Effect Transistors.
- Material Removal Mechanism
- Wide Bandgap Semiconductors
- Reliability
- Oscillators
- Low-k Dielectrics
- Tunnel Field-Effect Transistors
- Nanowire Transistors
- High-k Dielectrics
- Band Parameters
- Nanowires
- Atomic Layer Deposition
- III-Nitrides
- Semiconductors
- CMOS
- Microelectronics
- Quantum Dots
- Semiconductor
- Chemical Mechanical Planarization
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 18 words, with their numbers
- Nanowires123 topics
- Band Parameters82 topics
- Atomic Layer Deposition61 topic
- High-k Dielectrics61 topic
- III-Nitrides51 topic
- Nanowire Transistors51 topic
- Semiconductors51 topic
- Tunnel Field-Effect Transistors51 topic
- CMOS41 topic
- Low-k Dielectrics41 topic
- Microelectronics41 topic
- Oscillators41 topic
- Quantum Dots31 topic
- Reliability31 topic
- Semiconductor31 topic
- Wide Bandgap Semiconductors31 topic
- Chemical Mechanical Planarization21 topic
- Material Removal Mechanism21 topic
Where does Clement Huang work?
Clement Huang's main affiliation in the publication record is United Microelectronics (Taiwan), Taiwan.
How many publications and citations does Clement Huang have?
OpenAlex counts 15 works and 47 citations for Clement Huang, an h-index of 4, ranking #6,630,675 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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