Douglas Van Den Broeke
Douglas Van Den Broeke publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and 3D IC and TSV technologies.
- World rank
- #5,647,012 of 7,710,434 ranked researchers
- Rank in Netherlands
- #95,477 of 107,149
- Works
- 17
- Citations
- 99
- Citations per work
- 5.8
What does Douglas Van Den Broeke research?
Douglas Van Den Broeke's work is mostly in Engineering (76%), Materials Science (10%), Physics and Astronomy (4%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1590.1%
- Engineering1376.4%
- Materials Science29.8%
- Physics and Astronomy13.9%
- Everything else29.9%
- 1Electrical and Electronic Engineering59% of their works
- 2Biomedical Engineering10% of their works
- 3Surfaces, Coatings and Films10% of their works
- 4Radiation4% of their works
- 5Computational Mechanics4% of their works
- 6Industrial and Manufacturing Engineering4% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- 3D IC and TSV technologies
- Electron and X-Ray Spectroscopy Techniques
- Advanced Surface Polishing Techniques
- Near-Field Optical Microscopy
- Surface Roughness and Optical Measurements
- Industrial Vision Systems and Defect Detection
Which keywords describe Douglas Van Den Broeke's research?
The keywords of their largest research topics: Electron Beam Lithography, Nanofabrication, Failure Analysis, Integrated Circuits, Interconnect, Through-Silicon Via, Machine Vision and Scanning Electron Microscopy.
- Surface Characterization
- Photonic Nanojets
- Material Removal Mechanism
- Chemical Mechanical Planarization
- Scanning Electron Microscopy
- Through-Silicon Via
- Integrated Circuits
- Nanofabrication
- Electron Beam Lithography
- Failure Analysis
- Interconnect
- Machine Vision
- X-ray Photoelectron Spectroscopy
- Fabric Defect Detection
- Near-Field Optical Microscopy
- Roughness Measurement
- Texture Analysis
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 17 words, with their numbers
- Electron Beam Lithography161 topic
- Nanofabrication161 topic
- Failure Analysis71 topic
- Integrated Circuits71 topic
- Interconnect51 topic
- Through-Silicon Via51 topic
- Machine Vision42 topics
- Scanning Electron Microscopy41 topic
- X-ray Photoelectron Spectroscopy41 topic
- Chemical Mechanical Planarization21 topic
- Fabric Defect Detection21 topic
- Material Removal Mechanism21 topic
- Near-Field Optical Microscopy21 topic
- Photonic Nanojets21 topic
- Roughness Measurement21 topic
- Surface Characterization21 topic
- Texture Analysis21 topic
Where does Douglas Van Den Broeke work?
Douglas Van Den Broeke's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does Douglas Van Den Broeke have?
OpenAlex counts 17 works and 99 citations for Douglas Van Den Broeke, an h-index of 5, ranking #5,647,012 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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