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Researcher · Mentor Technologies · United States

Emile Y. Sahouria

Emile Y. Sahouria publishes mostly in Electrical and Electronic Engineering, Industrial and Manufacturing Engineering and Surfaces, Coatings and Films, on topics such as Advancements in Photolithography Techniques, Industrial Vision Systems and Defect Detection and Integrated Circuits and Semiconductor Failure Analysis.

OpenAlex
World rank
#5,209,929
of 7,710,434 ranked researchers
Rank in United States
#1,336,359
of 1,627,098
Works
42
Citations
433
Citations per work
10.3
h-index
9
i10-index 9Top 59% in Electrical and Electronic Engineering
Emile Y. Sahouria

What does Emile Y. Sahouria research?

Emile Y. Sahouria's work is mostly in Engineering (69%), Computer Science (10%), Materials Science (9%).

Physical Sciences: 37 works · 88.0% of their workEngineering: 29 works · 68.8% of their workElectrical and Electronic Engineering: 19 works · 46.4% of their workIndustrial and Manufacturing Engineering: 6 works · 14.4% of their workBiomedical Engineering: 3 works · 8.0% of their workComputer Science: 4 works · 10.4% of their workComputer Vision and Pattern Recognition: 3 works · 7.2% of their workComputer Networks and Communications: 1 works · 3.2% of their workMaterials Science: 4 works · 8.8% of their workSurfaces, Coatings and Films: 4 works · 8.8% of their workEverything else: 5 works · 12.0% of their workTHEIR WORKEmile Y. Sahouria42works
Physical Sciences88%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering2968.8%
    2. Computer Science410.4%
    3. Materials Science48.8%
  2. Everything else512.0%
  1. 1Electrical and Electronic Engineering46% of their works
  2. 2Industrial and Manufacturing Engineering14% of their works
  3. 3Surfaces, Coatings and Films9% of their works
  4. 4Biomedical Engineering8% of their works
  5. 5Computer Vision and Pattern Recognition7% of their works
  6. 6Computer Networks and Communications3% of their works

Research topics

Which keywords describe Emile Y. Sahouria's research?

The keywords of their largest research topics: Nanofabrication, Electron Beam Lithography, Resolution Limits, Fabric Defect Detection, Machine Vision, Failure Analysis, Integrated Circuits and Scanning Electron Microscopy.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 17 words, with their numbers
  1. Nanofabrication392 topics
  2. Electron Beam Lithography361 topic
  3. Resolution Limits361 topic
  4. Fabric Defect Detection141 topic
  5. Machine Vision141 topic
  6. Failure Analysis131 topic
  7. Integrated Circuits131 topic
  8. Scanning Electron Microscopy81 topic
  9. X-ray Photoelectron Spectroscopy81 topic
  10. Chemical Mechanical Planarization61 topic
  11. Material Removal Mechanism61 topic
  12. Antireflective Coatings31 topic
  13. Atomic Layer Deposition31 topic
  14. Content-Based Retrieval31 topic
  15. High-k Dielectrics31 topic
  16. Nanostructures31 topic
  17. Video Summarization31 topic

Where does Emile Y. Sahouria work?

Emile Y. Sahouria's main affiliation in the publication record is Mentor Technologies, United States.

How many publications and citations does Emile Y. Sahouria have?

OpenAlex counts 42 works and 433 citations for Emile Y. Sahouria, an h-index of 9, ranking #5,209,929 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

Discussion

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