Frank Bornebroek
Frank Bornebroek publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Advanced Surface Polishing Techniques.
- World rank
- #5,772,139 of 7,710,434 ranked researchers
- Rank in Netherlands
- #96,603 of 107,149
- Works
- 19
- Citations
- 174
- Citations per work
- 9.2
What does Frank Bornebroek research?
Frank Bornebroek's work is mostly in Engineering (74%), Materials Science (18%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1892.6%
- Engineering1474.4%
- Materials Science318.2%
- Everything else17.4%
- 1Electrical and Electronic Engineering55% of their works
- 2Biomedical Engineering13% of their works
- 3Surfaces, Coatings and Films13% of their works
- 4Electronic, Optical and Magnetic Materials6% of their works
- 5Industrial and Manufacturing Engineering4% of their works
- 6Mechanical Engineering4% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Advanced Surface Polishing Techniques
- Electron and X-Ray Spectroscopy Techniques
- Copper Interconnects and Reliability
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Advanced Measurement and Metrology Techniques
Which keywords describe Frank Bornebroek's research?
The keywords of their largest research topics: Electron Beam Lithography, Nanofabrication, Failure Analysis, Integrated Circuits, Chemical Mechanical Planarization, Material Removal Mechanism, Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy.
- Tunnel Field-Effect Transistors
- High-k Dielectrics
- Dimensional Metrology
- Microelectronics
- X-ray Photoelectron Spectroscopy
- Material Removal Mechanism
- Integrated Circuits
- Nanofabrication
- Electron Beam Lithography
- Failure Analysis
- Chemical Mechanical Planarization
- Scanning Electron Microscopy
- Low-k Dielectrics
- Atomic Layer Deposition
- Error Compensation
- Nanowire Transistors
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 16 words, with their numbers
- Electron Beam Lithography161 topic
- Nanofabrication161 topic
- Failure Analysis71 topic
- Integrated Circuits71 topic
- Chemical Mechanical Planarization61 topic
- Material Removal Mechanism61 topic
- Scanning Electron Microscopy61 topic
- X-ray Photoelectron Spectroscopy61 topic
- Low-k Dielectrics31 topic
- Microelectronics31 topic
- Atomic Layer Deposition21 topic
- Dimensional Metrology21 topic
- Error Compensation21 topic
- High-k Dielectrics21 topic
- Nanowire Transistors21 topic
- Tunnel Field-Effect Transistors21 topic
Where does Frank Bornebroek work?
Frank Bornebroek's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does Frank Bornebroek have?
OpenAlex counts 19 works and 174 citations for Frank Bornebroek, an h-index of 9, ranking #5,772,139 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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