Franklin M. Schellenberg
Franklin M. Schellenberg publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Industrial and Manufacturing Engineering, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Industrial Vision Systems and Defect Detection.
- World rank
- #6,294,123 of 7,710,434 ranked researchers
- Rank in United States
- #1,500,388 of 1,627,098
- Works
- 37
- Citations
- 337
- Citations per work
- 9.1
What does Franklin M. Schellenberg research?
Franklin M. Schellenberg's work is mostly in Engineering (74%), Materials Science (11%), Physics and Astronomy (3%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3287.7%
- Engineering2773.6%
- Materials Science411.3%
- Physics and Astronomy12.8%
- Everything else512.3%
- 1Electrical and Electronic Engineering48% of their works
- 2Surfaces, Coatings and Films11% of their works
- 3Industrial and Manufacturing Engineering10% of their works
- 4Biomedical Engineering9% of their works
- 5Computational Mechanics6% of their works
- 6Atomic and Molecular Physics, and Optics3% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Industrial Vision Systems and Defect Detection
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
- Advanced optical system design
- Laser Material Processing Techniques
- Surface Roughness and Optical Measurements
Which keywords describe Franklin M. Schellenberg's research?
The keywords of their largest research topics: Nanofabrication, Electron Beam Lithography, Resolution Limits, Machine Vision, Failure Analysis, Integrated Circuits, Fabric Defect Detection and Texture Analysis.
- Surface Characterization
- Micromachining
- Freeform Optics
- Nanostructures
- X-ray Photoelectron Spectroscopy
- Texture Analysis
- Integrated Circuits
- Machine Vision
- Electron Beam Lithography
- Nanofabrication
- Resolution Limits
- Failure Analysis
- Fabric Defect Detection
- Scanning Electron Microscopy
- Antireflective Coatings
- Compound Eyes
- Femtosecond Laser
- Roughness Measurement
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 18 words, with their numbers
- Nanofabrication342 topics
- Electron Beam Lithography291 topic
- Resolution Limits291 topic
- Machine Vision132 topics
- Failure Analysis121 topic
- Integrated Circuits121 topic
- Fabric Defect Detection101 topic
- Texture Analysis101 topic
- Scanning Electron Microscopy71 topic
- X-ray Photoelectron Spectroscopy71 topic
- Antireflective Coatings51 topic
- Nanostructures51 topic
- Compound Eyes41 topic
- Freeform Optics41 topic
- Femtosecond Laser31 topic
- Micromachining31 topic
- Roughness Measurement31 topic
- Surface Characterization31 topic
Where does Franklin M. Schellenberg work?
Franklin M. Schellenberg's main affiliation in the publication record is Mentor Technologies, United States.
How many publications and citations does Franklin M. Schellenberg have?
OpenAlex counts 37 works and 337 citations for Franklin M. Schellenberg, an h-index of 9, ranking #6,294,123 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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