James M. Oberschmidt
James M. Oberschmidt publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Surfaces, Coatings and Films, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Electron and X-Ray Spectroscopy Techniques.
- World rank
- #3,026,734 of 7,710,434 ranked researchers
- Rank in United States
- #867,718 of 1,627,098
- Works
- 40
- Citations
- 604
- Citations per work
- 15.1
What does James M. Oberschmidt research?
James M. Oberschmidt's work is mostly in Engineering (65%), Materials Science (16%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3381.4%
- Engineering2665.3%
- Materials Science616.1%
- Everything else718.6%
- 1Electrical and Electronic Engineering47% of their works
- 2Materials Chemistry8% of their works
- 3Surfaces, Coatings and Films8% of their works
- 4Mechanical Engineering7% of their works
- 5Industrial and Manufacturing Engineering7% of their works
- 6Biomedical Engineering5% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Electron and X-Ray Spectroscopy Techniques
- Industrial Vision Systems and Defect Detection
- Inorganic Fluorides and Related Compounds
- Semiconductor materials and devices
- Advanced Surface Polishing Techniques
- Solid-state spectroscopy and crystallography
Which keywords describe James M. Oberschmidt's research?
The keywords of their largest research topics: Electron Beam Lithography, Nanofabrication, Failure Analysis, Integrated Circuits, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Fabric Defect Detection and Machine Vision.
- Solid Acids
- Material Removal Mechanism
- Noble Gas Compounds
- Fluoride Ion Batteries
- Machine Vision
- X-ray Photoelectron Spectroscopy
- Integrated Circuits
- Nanofabrication
- Electron Beam Lithography
- Failure Analysis
- Scanning Electron Microscopy
- Fabric Defect Detection
- Atomic Layer Deposition
- High-k Dielectrics
- Chemical Mechanical Planarization
- Protonic Conduction
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 16 words, with their numbers
- Electron Beam Lithography261 topic
- Nanofabrication261 topic
- Failure Analysis101 topic
- Integrated Circuits101 topic
- Scanning Electron Microscopy91 topic
- X-ray Photoelectron Spectroscopy91 topic
- Fabric Defect Detection81 topic
- Machine Vision81 topic
- Atomic Layer Deposition51 topic
- Fluoride Ion Batteries51 topic
- High-k Dielectrics51 topic
- Noble Gas Compounds51 topic
- Chemical Mechanical Planarization41 topic
- Material Removal Mechanism41 topic
- Protonic Conduction41 topic
- Solid Acids41 topic
Where does James M. Oberschmidt work?
James M. Oberschmidt's main affiliation in the publication record is IBM (United States), United States.
How many publications and citations does James M. Oberschmidt have?
OpenAlex counts 40 works and 604 citations for James M. Oberschmidt, an h-index of 13, ranking #3,026,734 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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