Jason Plumhoff
Jason Plumhoff publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering, on topics such as Advancements in Photolithography Techniques, Semiconductor materials and devices and Plasma Diagnostics and Applications.
- World rank
- #7,149,268 of 7,710,434 ranked researchers
- Rank in United States
- #1,587,285 of 1,627,098
- Works
- 24
- Citations
- 43
- Citations per work
- 1.8
What does Jason Plumhoff research?
Jason Plumhoff's work is mostly in Engineering (71%), Materials Science (21%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences2291.8%
- Engineering1770.9%
- Materials Science520.9%
- Everything else28.2%
- 1Electrical and Electronic Engineering61% of their works
- 2Surfaces, Coatings and Films14% of their works
- 3Biomedical Engineering6% of their works
- 4Mechanical Engineering4% of their works
- 5Materials Chemistry4% of their works
- 6Electronic, Optical and Magnetic Materials3% of their works
Research topics
- Advancements in Photolithography Techniques
- Semiconductor materials and devices
- Plasma Diagnostics and Applications
- Optical Coatings and Gratings
- Advanced Surface Polishing Techniques
- Electron and X-Ray Spectroscopy Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- 3D IC and TSV technologies
Which keywords describe Jason Plumhoff's research?
The keywords of their largest research topics: Nanofabrication, Electron Beam Lithography, Resolution Limits, Atomic Layer Deposition, High-k Dielectrics, Antireflective Coatings, Nanostructures and Plasma Etching.
- Interconnect
- Failure Analysis
- Scanning Electron Microscopy
- Chemical Mechanical Planarization
- Plasma Etching
- Antireflective Coatings
- Atomic Layer Deposition
- Electron Beam Lithography
- Nanofabrication
- Resolution Limits
- High-k Dielectrics
- Nanostructures
- Semiconductor Industry
- Material Removal Mechanism
- X-ray Photoelectron Spectroscopy
- Integrated Circuits
- Through-Silicon Via
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 17 words, with their numbers
- Nanofabrication252 topics
- Electron Beam Lithography181 topic
- Resolution Limits181 topic
- Atomic Layer Deposition111 topic
- High-k Dielectrics111 topic
- Antireflective Coatings71 topic
- Nanostructures71 topic
- Plasma Etching71 topic
- Semiconductor Industry71 topic
- Chemical Mechanical Planarization31 topic
- Material Removal Mechanism31 topic
- Scanning Electron Microscopy31 topic
- X-ray Photoelectron Spectroscopy31 topic
- Failure Analysis21 topic
- Integrated Circuits21 topic
- Interconnect21 topic
- Through-Silicon Via21 topic
Where does Jason Plumhoff work?
Jason Plumhoff's main affiliation in the publication record is Plasma Processes (United States), United States.
How many publications and citations does Jason Plumhoff have?
OpenAlex counts 24 works and 43 citations for Jason Plumhoff, an h-index of 3, ranking #7,149,268 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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