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Researcher · KLA (United States) · United States

Jeffrey D. Byers

Jeffrey D. Byers publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics, on topics such as Advancements in Photolithography Techniques, Nanofabrication and Lithography Techniques and Integrated Circuits and Semiconductor Failure Analysis.

OpenAlex
World rank
#3,375,722
of 7,710,434 ranked researchers
Rank in United States
#950,474
of 1,627,098
Works
52
Citations
1.7k
Citations per work
32.3
h-index
21
i10-index 30Top 16% in Electrical and Electronic Engineering
Jeffrey D. Byers

What does Jeffrey D. Byers research?

Jeffrey D. Byers's work is mostly in Engineering (54%), Physics and Astronomy (10%), Chemistry (8%).

Physical Sciences: 40 works · 77.1% of their workEngineering: 28 works · 53.9% of their workElectrical and Electronic Engineering: 20 works · 38.3% of their workBiomedical Engineering: 8 works · 15.6% of their workPhysics and Astronomy: 5 works · 9.7% of their workAtomic and Molecular Physics, and Optics: 5 works · 9.7% of their workChemistry: 4 works · 7.7% of their workOrganic Chemistry: 2 works · 4.5% of their workPhysical and Theoretical Chemistry: 2 works · 3.2% of their workMaterials Science: 3 works · 5.8% of their workSurfaces, Coatings and Films: 3 works · 5.8% of their workEverything else: 12 works · 22.9% of their workTHEIR WORKJeffrey D. Byers52works
Physical Sciences77%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering2853.9%
    2. Physics and Astronomy59.7%
    3. Chemistry47.7%
    4. Materials Science35.8%
  2. Everything else1222.9%
  1. 1Electrical and Electronic Engineering38% of their works
  2. 2Biomedical Engineering16% of their works
  3. 3Atomic and Molecular Physics, and Optics10% of their works
  4. 4Surfaces, Coatings and Films6% of their works
  5. 5Organic Chemistry4% of their works
  6. 6Physical and Theoretical Chemistry3% of their works

Research topics

Which keywords describe Jeffrey D. Byers's research?

The keywords of their largest research topics: High-Resolution Patterning, Electron Beam Lithography, Nanofabrication, Hydrogen Bonding, Nanolithography, Soft Lithography, Failure Analysis and Integrated Circuits.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 18 words, with their numbers
  1. High-Resolution Patterning452 topics
  2. Electron Beam Lithography321 topic
  3. Nanofabrication321 topic
  4. Hydrogen Bonding132 topics
  5. Nanolithography131 topic
  6. Soft Lithography131 topic
  7. Failure Analysis101 topic
  8. Integrated Circuits101 topic
  9. Photosynthesis81 topic
  10. Quantum Coherence81 topic
  11. Scanning Electron Microscopy71 topic
  12. X-ray Photoelectron Spectroscopy71 topic
  13. Chemical Mechanical Planarization61 topic
  14. Material Removal Mechanism61 topic
  15. Excited-State Proton Transfer51 topic
  16. Intramolecular Charge Transfer51 topic
  17. Photoinitiation41 topic
  18. Polymerization41 topic

Where does Jeffrey D. Byers work?

Jeffrey D. Byers's main affiliation in the publication record is KLA (United States), United States.

How many publications and citations does Jeffrey D. Byers have?

OpenAlex counts 52 works and 1,682 citations for Jeffrey D. Byers, an h-index of 21, ranking #3,375,722 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

Discussion

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