John D. Zimmerman
John D. Zimmerman publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering, on topics such as Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques and Integrated Circuits and Semiconductor Failure Analysis.
- World rank
- #5,620,697 of 7,710,434 ranked researchers
- Rank in Netherlands
- #95,239 of 107,149
- Works
- 28
- Citations
- 349
- Citations per work
- 12.5
What does John D. Zimmerman research?
John D. Zimmerman's work is mostly in Engineering (70%), Materials Science (20%), Computer Science (1%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences2691.2%
- Engineering1969.6%
- Materials Science620.3%
- Computer Science01.3%
- Everything else28.8%
- 1Electrical and Electronic Engineering54% of their works
- 2Surfaces, Coatings and Films20% of their works
- 3Biomedical Engineering6% of their works
- 4Mechanical Engineering5% of their works
- 5Industrial and Manufacturing Engineering4% of their works
- 6Computer Vision and Pattern Recognition1% of their works
Research topics
- Advancements in Photolithography Techniques
- Electron and X-Ray Spectroscopy Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Advanced Surface Polishing Techniques
- 3D IC and TSV technologies
- Industrial Vision Systems and Defect Detection
- Silicon and Solar Cell Technologies
- Advanced Measurement and Metrology Techniques
Which keywords describe John D. Zimmerman's research?
The keywords of their largest research topics: Electron Beam Lithography, Nanofabrication, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Failure Analysis, Integrated Circuits, Chemical Mechanical Planarization and Material Removal Mechanism.
- Solar Cells
- Error Compensation
- Through-Silicon Via
- Interconnect
- Material Removal Mechanism
- Integrated Circuits
- X-ray Photoelectron Spectroscopy
- Nanofabrication
- Electron Beam Lithography
- Scanning Electron Microscopy
- Failure Analysis
- Chemical Mechanical Planarization
- Fabric Defect Detection
- Machine Vision
- Dimensional Metrology
- Silicon
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 16 words, with their numbers
- Electron Beam Lithography241 topic
- Nanofabrication241 topic
- Scanning Electron Microscopy161 topic
- X-ray Photoelectron Spectroscopy161 topic
- Failure Analysis131 topic
- Integrated Circuits131 topic
- Chemical Mechanical Planarization51 topic
- Material Removal Mechanism51 topic
- Fabric Defect Detection31 topic
- Interconnect31 topic
- Machine Vision31 topic
- Through-Silicon Via31 topic
- Dimensional Metrology21 topic
- Error Compensation21 topic
- Silicon21 topic
- Solar Cells21 topic
Where does John D. Zimmerman work?
John D. Zimmerman's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does John D. Zimmerman have?
OpenAlex counts 28 works and 349 citations for John D. Zimmerman, an h-index of 11, ranking #5,620,697 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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