Jos P. H. Benschop
Jos P. H. Benschop publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Electron and X-Ray Spectroscopy Techniques.
- World rank
- #3,690,524 of 7,710,434 ranked researchers
- Rank in Netherlands
- #72,130 of 107,149
- Works
- 52
- Citations
- 839
- Citations per work
- 16.1
What does Jos P. H. Benschop research?
Jos P. H. Benschop's work is mostly in Engineering (59%), Materials Science (23%), Physics and Astronomy (5%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences4587.1%
- Engineering3159.2%
- Materials Science1223.1%
- Physics and Astronomy24.8%
- Everything else712.9%
- 1Electrical and Electronic Engineering42% of their works
- 2Surfaces, Coatings and Films14% of their works
- 3Biomedical Engineering12% of their works
- 4Materials Chemistry9% of their works
- 5Atomic and Molecular Physics, and Optics5% of their works
- 6Mechanical Engineering5% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Electron and X-Ray Spectroscopy Techniques
- Nanofabrication and Lithography Techniques
- Optical Coatings and Gratings
- Advanced Surface Polishing Techniques
- Advanced optical system design
- Semiconductor materials and devices
Which keywords describe Jos P. H. Benschop's research?
The keywords of their largest research topics: High-Resolution Patterning, Nanofabrication, Electron Beam Lithography, Resolution Limits, Failure Analysis, Integrated Circuits, Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy.
- Material Removal Mechanism
- Freeform Optics
- Chemical Mechanical Planarization
- Nanostructures
- Soft Lithography
- X-ray Photoelectron Spectroscopy
- Integrated Circuits
- Resolution Limits
- Nanofabrication
- High-Resolution Patterning
- Electron Beam Lithography
- Failure Analysis
- Scanning Electron Microscopy
- Nanolithography
- Antireflective Coatings
- Atomic Layer Deposition
- Compound Eyes
- High-k Dielectrics
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 18 words, with their numbers
- High-Resolution Patterning412 topics
- Nanofabrication382 topics
- Electron Beam Lithography331 topic
- Resolution Limits331 topic
- Failure Analysis161 topic
- Integrated Circuits161 topic
- Scanning Electron Microscopy161 topic
- X-ray Photoelectron Spectroscopy161 topic
- Nanolithography81 topic
- Soft Lithography81 topic
- Antireflective Coatings51 topic
- Nanostructures51 topic
- Atomic Layer Deposition41 topic
- Chemical Mechanical Planarization41 topic
- Compound Eyes41 topic
- Freeform Optics41 topic
- High-k Dielectrics41 topic
- Material Removal Mechanism41 topic
Where does Jos P. H. Benschop work?
Jos P. H. Benschop's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does Jos P. H. Benschop have?
OpenAlex counts 52 works and 839 citations for Jos P. H. Benschop, an h-index of 16, ranking #3,690,524 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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