Kaori Tai
Kaori Tai publishes mostly in Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials, on topics such as Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design and Semiconductor materials and interfaces.
- World rank
- #7,423,053 of 7,710,434 ranked researchers
- Rank in Taiwan
- #55,753 of 57,035
- Works
- 32
- Citations
- 210
- Citations per work
- 6.6
What does Kaori Tai research?
Kaori Tai's work is mostly in Engineering (76%), Physics and Astronomy (13%), Materials Science (8%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3197.0%
- Engineering2475.9%
- Physics and Astronomy412.6%
- Materials Science38.5%
- Everything else13.0%
- 1Electrical and Electronic Engineering70% of their works
- 2Atomic and Molecular Physics, and Optics13% of their works
- 3Electronic, Optical and Magnetic Materials5% of their works
- 4Materials Chemistry3% of their works
- 5Mechanical Engineering3% of their works
- 6Biomedical Engineering3% of their works
Research topics
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Semiconductor materials and interfaces
- Integrated Circuits and Semiconductor Failure Analysis
- Ferroelectric and Negative Capacitance Devices
- Copper Interconnects and Reliability
- Intermetallics and Advanced Alloy Properties
- Advanced Surface Polishing Techniques
Which keywords describe Kaori Tai's research?
The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Nanowire Transistors, Tunnel Field-Effect Transistors, Metal-Semiconductor Contacts, Schottky Barrier, Thin Films and Failure Analysis.
- Chemical Mechanical Planarization
- Intermetallic Alloys
- Low-k Dielectrics
- Ferroelectricity
- Failure Analysis
- Schottky Barrier
- Tunnel Field-Effect Transistors
- High-k Dielectrics
- Atomic Layer Deposition
- Nanowire Transistors
- Metal-Semiconductor Contacts
- Thin Films
- Integrated Circuits
- Hafnium Oxide
- Microelectronics
- TiAl Alloys
- Material Removal Mechanism
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- Atomic Layer Deposition241 topic
- High-k Dielectrics241 topic
- Nanowire Transistors191 topic
- Tunnel Field-Effect Transistors191 topic
- Metal-Semiconductor Contacts101 topic
- Schottky Barrier101 topic
- Thin Films102 topics
- Failure Analysis91 topic
- Integrated Circuits91 topic
- Ferroelectricity61 topic
- Hafnium Oxide61 topic
- Low-k Dielectrics41 topic
- Microelectronics41 topic
- Intermetallic Alloys31 topic
- TiAl Alloys31 topic
- Chemical Mechanical Planarization21 topic
- Material Removal Mechanism21 topic
Where does Kaori Tai work?
Kaori Tai's main affiliation in the publication record is Sony (Taiwan), Taiwan.
How many publications and citations does Kaori Tai have?
OpenAlex counts 32 works and 210 citations for Kaori Tai, an h-index of 9, ranking #7,423,053 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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