Marc Hennemeyer
Marc Hennemeyer publishes mostly in Biomedical Engineering, Electrical and Electronic Engineering and Surfaces, Coatings and Films, on topics such as Nanofabrication and Lithography Techniques, Advancements in Photolithography Techniques and Advanced optical system design.
- World rank
- #6,273,081 of 7,710,434 ranked researchers
- Rank in Germany
- #318,280 of 364,343
- Works
- 18
- Citations
- 220
- Citations per work
- 12.2
What does Marc Hennemeyer research?
Marc Hennemeyer's work is mostly in Engineering (73%), Materials Science (8%), Physics and Astronomy (8%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1688.4%
- Engineering1373.0%
- Materials Science17.7%
- Physics and Astronomy17.7%
- Everything else211.6%
- 1Biomedical Engineering35% of their works
- 2Electrical and Electronic Engineering31% of their works
- 3Surfaces, Coatings and Films8% of their works
- 4Atomic and Molecular Physics, and Optics8% of their works
- 5Mechanical Engineering4% of their works
- 6Industrial and Manufacturing Engineering4% of their works
Research topics
- Nanofabrication and Lithography Techniques
- Advancements in Photolithography Techniques
- Advanced optical system design
- 3D IC and TSV technologies
- Microfluidic and Bio-sensing Technologies
- Advanced Measurement and Metrology Techniques
- Surface Modification and Superhydrophobicity
- Force Microscopy Techniques and Applications
Which keywords describe Marc Hennemeyer's research?
The keywords of their largest research topics: High-Resolution Patterning, Biological Applications, Electron Beam Lithography, Nanofabrication, Nanolithography, Soft Lithography, Compound Eyes and Freeform Optics.
- Superhydrophobic Surfaces
- Microfluidics
- Error Compensation
- Bioinspired Design
- Through-Silicon Via
- Freeform Optics
- Soft Lithography
- Nanofabrication
- Biological Applications
- High-Resolution Patterning
- Electron Beam Lithography
- Nanolithography
- Compound Eyes
- Interconnect
- Atomic Force Microscopy
- Dimensional Metrology
- Force Spectroscopy
- Particle Separation
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 18 words, with their numbers
- High-Resolution Patterning142 topics
- Biological Applications92 topics
- Electron Beam Lithography71 topic
- Nanofabrication71 topic
- Nanolithography71 topic
- Soft Lithography71 topic
- Compound Eyes61 topic
- Freeform Optics61 topic
- Interconnect41 topic
- Through-Silicon Via41 topic
- Atomic Force Microscopy21 topic
- Bioinspired Design21 topic
- Dimensional Metrology21 topic
- Error Compensation21 topic
- Force Spectroscopy21 topic
- Microfluidics21 topic
- Particle Separation21 topic
- Superhydrophobic Surfaces21 topic
Where does Marc Hennemeyer work?
Marc Hennemeyer's main affiliation in the publication record is SUSS MicroTec (Germany), Germany.
How many publications and citations does Marc Hennemeyer have?
OpenAlex counts 18 works and 220 citations for Marc Hennemeyer, an h-index of 8, ranking #6,273,081 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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