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Researcher · STMicroelectronics (Czechia) · Czechia

Mauro Alessandri

Mauro Alessandri publishes mostly in Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Mechanics of Materials, on topics such as Semiconductor materials and devices, Copper Interconnects and Reliability and Metal and Thin Film Mechanics.

OpenAlex
World rank
#6,116,220
of 7,710,434 ranked researchers
Rank in Czechia
#24,702
of 39,303
Works
38
Citations
76
Citations per work
2.0
h-index
4
i10-index 1Top 94% in Electrical and Electronic Engineering
Mauro Alessandri

What does Mauro Alessandri research?

Mauro Alessandri's work is mostly in Engineering (63%), Materials Science (18%).

Physical Sciences: 31 works · 81.7% of their workEngineering: 24 works · 63.3% of their workElectrical and Electronic Engineering: 17 works · 43.9% of their workMechanics of Materials: 4 works · 10.2% of their workComputational Mechanics: 2 works · 5.1% of their workBiomedical Engineering: 2 works · 4.1% of their workMaterials Science: 7 works · 18.4% of their workElectronic, Optical and Magnetic Materials: 5 works · 14.3% of their workMaterials Chemistry: 2 works · 4.1% of their workEverything else: 7 works · 18.3% of their workTHEIR WORKMauro Alessandri38works
Physical Sciences82%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering2463.3%
    2. Materials Science718.4%
  2. Everything else718.3%
  1. 1Electrical and Electronic Engineering44% of their works
  2. 2Electronic, Optical and Magnetic Materials14% of their works
  3. 3Mechanics of Materials10% of their works
  4. 4Computational Mechanics5% of their works
  5. 5Biomedical Engineering4% of their works
  6. 6Materials Chemistry4% of their works

Research topics

Which keywords describe Mauro Alessandri's research?

The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Thin Films, Low-k Dielectrics, Microelectronics, Coatings, Nanoindentation and Electron Beam Lithography.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 17 words, with their numbers
  1. Atomic Layer Deposition231 topic
  2. High-k Dielectrics231 topic
  3. Thin Films222 topics
  4. Low-k Dielectrics141 topic
  5. Microelectronics141 topic
  6. Coatings81 topic
  7. Nanoindentation81 topic
  8. Electron Beam Lithography51 topic
  9. Nanofabrication51 topic
  10. Chemical Mechanical Planarization41 topic
  11. Material Removal Mechanism41 topic
  12. Plasma Etching41 topic
  13. Semiconductor Industry41 topic
  14. Silicon41 topic
  15. Solar Cells41 topic
  16. Failure Analysis31 topic
  17. Integrated Circuits31 topic

Where does Mauro Alessandri work?

Mauro Alessandri's main affiliation in the publication record is STMicroelectronics (Czechia), Czechia.

How many publications and citations does Mauro Alessandri have?

OpenAlex counts 38 works and 76 citations for Mauro Alessandri, an h-index of 4, ranking #6,116,220 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

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