Michael C. Lam
Michael C. Lam publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Electron and X-Ray Spectroscopy Techniques.
- World rank
- #6,742,133 of 7,710,434 ranked researchers
- Rank in United States
- #1,551,319 of 1,627,098
- Works
- 41
- Citations
- 335
- Citations per work
- 8.2
What does Michael C. Lam research?
Michael C. Lam's work is mostly in Engineering (66%), Materials Science (23%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3789.1%
- Engineering2766.1%
- Materials Science923.0%
- Everything else410.9%
- 1Electrical and Electronic Engineering52% of their works
- 2Surfaces, Coatings and Films20% of their works
- 3Biomedical Engineering9% of their works
- 4Electronic, Optical and Magnetic Materials3% of their works
- 5Mechanical Engineering3% of their works
- 6Computational Mechanics2% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Electron and X-Ray Spectroscopy Techniques
- Advanced Surface Polishing Techniques
- Optical Coatings and Gratings
- Surface Roughness and Optical Measurements
- Non-Destructive Testing Techniques
- Ga2O3 and related materials
Which keywords describe Michael C. Lam's research?
The keywords of their largest research topics: Nanofabrication, Electron Beam Lithography, Resolution Limits, Failure Analysis, Integrated Circuits, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy and Chemical Mechanical Planarization.
- Semiconductor
- Non-Destructive Evaluation
- Eddy Current Testing
- Antireflective Coatings
- Chemical Mechanical Planarization
- Scanning Electron Microscopy
- Failure Analysis
- Electron Beam Lithography
- Nanofabrication
- Resolution Limits
- Integrated Circuits
- X-ray Photoelectron Spectroscopy
- Material Removal Mechanism
- Nanostructures
- Gallium Oxide
- Roughness Measurement
- Surface Characterization
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- Nanofabrication382 topics
- Electron Beam Lithography321 topic
- Resolution Limits321 topic
- Failure Analysis191 topic
- Integrated Circuits191 topic
- Scanning Electron Microscopy161 topic
- X-ray Photoelectron Spectroscopy161 topic
- Chemical Mechanical Planarization91 topic
- Material Removal Mechanism91 topic
- Antireflective Coatings61 topic
- Nanostructures61 topic
- Eddy Current Testing21 topic
- Gallium Oxide21 topic
- Non-Destructive Evaluation21 topic
- Roughness Measurement21 topic
- Semiconductor21 topic
- Surface Characterization21 topic
Where does Michael C. Lam work?
Michael C. Lam's main affiliation in the publication record is Mentor Technologies, United States.
How many publications and citations does Michael C. Lam have?
OpenAlex counts 41 works and 335 citations for Michael C. Lam, an h-index of 11, ranking #6,742,133 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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