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Researcher · NXP (Germany) · Germany

Ralf Schuster

Ralf Schuster publishes mostly in Electrical and Electronic Engineering, Industrial and Manufacturing Engineering and Biomedical Engineering, on topics such as Advancements in Photolithography Techniques, 3D IC and TSV technologies and Integrated Circuits and Semiconductor Failure Analysis.

ORCID 0000-0003-3998-2219 OpenAlex
World rank
#5,290,355
of 7,710,434 ranked researchers
Rank in Germany
#273,621
of 364,343
Works
15
Citations
131
Citations per work
8.7
h-index
3
i10-index 1Top 97% in Electrical and Electronic Engineering
Ralf Schuster

What does Ralf Schuster research?

Ralf Schuster's work is mostly in Engineering (86%), Computer Science (5%).

Physical Sciences: 14 works · 90.4% of their workEngineering: 13 works · 85.5% of their workElectrical and Electronic Engineering: 7 works · 48.8% of their workIndustrial and Manufacturing Engineering: 2 works · 12.2% of their workBiomedical Engineering: 1 works · 9.8% of their workMechanical Engineering: 1 works · 9.8% of their workMechanics of Materials: 1 works · 4.9% of their workComputer Science: 1 works · 4.9% of their workHardware and Architecture: 1 works · 4.9% of their workEverything else: 1 works · 9.6% of their workTHEIR WORKRalf Schuster15works
Physical Sciences90%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering1385.5%
    2. Computer Science14.9%
  2. Everything else19.6%
  1. 1Electrical and Electronic Engineering49% of their works
  2. 2Industrial and Manufacturing Engineering12% of their works
  3. 3Biomedical Engineering10% of their works
  4. 4Mechanical Engineering10% of their works
  5. 5Hardware and Architecture5% of their works
  6. 6Mechanics of Materials5% of their works

Research topics

Which keywords describe Ralf Schuster's research?

The keywords of their largest research topics: Electron Beam Lithography, Nanofabrication, Interconnect, Through-Silicon Via, Fabric Defect Detection, Failure Analysis, Integrated Circuits and Machine Vision.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 16 words, with their numbers
  1. Electron Beam Lithography101 topic
  2. Nanofabrication101 topic
  3. Interconnect51 topic
  4. Through-Silicon Via51 topic
  5. Fabric Defect Detection31 topic
  6. Failure Analysis31 topic
  7. Integrated Circuits31 topic
  8. Machine Vision31 topic
  9. Chemical Mechanical Planarization21 topic
  10. Dimensional Metrology21 topic
  11. Embedded Cores21 topic
  12. Error Compensation21 topic
  13. Material Removal Mechanism21 topic
  14. Test Data Compression21 topic
  15. Cell Mechanics11 topic
  16. Extracellular Matrix11 topic

Where does Ralf Schuster work?

Ralf Schuster's main affiliation in the publication record is NXP (Germany), Germany.

How many publications and citations does Ralf Schuster have?

OpenAlex counts 15 works and 131 citations for Ralf Schuster, an h-index of 3, ranking #5,290,355 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Other researchers named Ralf Schuster

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

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