Rik Hoefnagels
Rik Hoefnagels publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Advanced Surface Polishing Techniques.
- World rank
- #6,181,917 of 7,710,434 ranked researchers
- Rank in Netherlands
- #99,900 of 107,149
- Works
- 26
- Citations
- 285
- Citations per work
- 11.0
What does Rik Hoefnagels research?
Rik Hoefnagels's work is mostly in Engineering (79%), Materials Science (13%), Physics and Astronomy (3%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences2594.7%
- Engineering2178.9%
- Materials Science313.2%
- Physics and Astronomy12.6%
- Everything else15.3%
- 1Electrical and Electronic Engineering63% of their works
- 2Surfaces, Coatings and Films13% of their works
- 3Biomedical Engineering12% of their works
- 4Computational Mechanics3% of their works
- 5Radiation3% of their works
- 6Aerospace Engineering1% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Advanced Surface Polishing Techniques
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
- Laser Material Processing Techniques
- Advanced X-ray Imaging Techniques
- Military Technology and Strategies
Which keywords describe Rik Hoefnagels's research?
The keywords of their largest research topics: Nanofabrication, Electron Beam Lithography, Resolution Limits, Failure Analysis, Integrated Circuits, Chemical Mechanical Planarization, Material Removal Mechanism and Scanning Electron Microscopy.
- Air Force
- Phase Retrieval
- Femtosecond Laser
- Antireflective Coatings
- Scanning Electron Microscopy
- Chemical Mechanical Planarization
- Failure Analysis
- Electron Beam Lithography
- Nanofabrication
- Resolution Limits
- Integrated Circuits
- Material Removal Mechanism
- X-ray Photoelectron Spectroscopy
- Nanostructures
- Micromachining
- X-ray Imaging
- Modernization
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 17 words, with their numbers
- Nanofabrication272 topics
- Electron Beam Lithography241 topic
- Resolution Limits241 topic
- Failure Analysis201 topic
- Integrated Circuits201 topic
- Chemical Mechanical Planarization81 topic
- Material Removal Mechanism81 topic
- Scanning Electron Microscopy71 topic
- X-ray Photoelectron Spectroscopy71 topic
- Antireflective Coatings31 topic
- Nanostructures31 topic
- Femtosecond Laser21 topic
- Micromachining21 topic
- Phase Retrieval21 topic
- X-ray Imaging21 topic
- Air Force11 topic
- Modernization11 topic
Where does Rik Hoefnagels work?
Rik Hoefnagels's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does Rik Hoefnagels have?
OpenAlex counts 26 works and 285 citations for Rik Hoefnagels, an h-index of 10, ranking #6,181,917 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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