Takeaki Ebihara
Takeaki Ebihara publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Nanofabrication and Lithography Techniques.
- World rank
- #5,449,718 of 7,710,434 ranked researchers
- Rank in United States
- #1,377,771 of 1,627,098
- Works
- 20
- Citations
- 169
- Citations per work
- 8.5
What does Takeaki Ebihara research?
Takeaki Ebihara's work is mostly in Engineering (75%), Materials Science (16%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1891.2%
- Engineering1575.4%
- Materials Science315.8%
- Everything else28.8%
- 1Electrical and Electronic Engineering49% of their works
- 2Surfaces, Coatings and Films16% of their works
- 3Biomedical Engineering14% of their works
- 4Computational Mechanics7% of their works
- 5Industrial and Manufacturing Engineering4% of their works
- 6Mechanical Engineering2% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Nanofabrication and Lithography Techniques
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
- Advanced Surface Polishing Techniques
- Fluid Dynamics and Turbulent Flows
- Industrial Vision Systems and Defect Detection
Which keywords describe Takeaki Ebihara's research?
The keywords of their largest research topics: High-Resolution Patterning, Nanofabrication, Electron Beam Lithography, Resolution Limits, Failure Analysis, Integrated Circuits, Antireflective Coatings and Nanolithography.
- Vortex Dynamics
- Material Removal Mechanism
- Fabric Defect Detection
- X-ray Photoelectron Spectroscopy
- Scanning Electron Microscopy
- Nanolithography
- Integrated Circuits
- Resolution Limits
- Nanofabrication
- High-Resolution Patterning
- Electron Beam Lithography
- Failure Analysis
- Antireflective Coatings
- Nanostructures
- Soft Lithography
- Chemical Mechanical Planarization
- Machine Vision
- Turbulent Flows
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 18 words, with their numbers
- High-Resolution Patterning192 topics
- Nanofabrication192 topics
- Electron Beam Lithography151 topic
- Resolution Limits151 topic
- Failure Analysis81 topic
- Integrated Circuits81 topic
- Antireflective Coatings41 topic
- Nanolithography41 topic
- Nanostructures41 topic
- Scanning Electron Microscopy41 topic
- Soft Lithography41 topic
- X-ray Photoelectron Spectroscopy41 topic
- Chemical Mechanical Planarization21 topic
- Fabric Defect Detection21 topic
- Machine Vision21 topic
- Material Removal Mechanism21 topic
- Turbulent Flows21 topic
- Vortex Dynamics21 topic
Where does Takeaki Ebihara work?
Takeaki Ebihara's main affiliation in the publication record is Canon (United States), United States.
How many publications and citations does Takeaki Ebihara have?
OpenAlex counts 20 works and 169 citations for Takeaki Ebihara, an h-index of 6, ranking #5,449,718 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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