Tomoaki Nishimura
Tomoaki Nishimura publishes mostly in Electrical and Electronic Engineering, Computational Mechanics and Materials Chemistry, on topics such as Ion-surface interactions and analysis, Semiconductor materials and devices and Electron and X-Ray Spectroscopy Techniques.
- World rank
- #1,134,720 of 1,633,909 ranked researchers
- Rank in Japan
- #67,516 of 114,622
- Works
- 41
- Citations
- 58
- Citations per work
- 1.4
What does Tomoaki Nishimura research?
Shares of their own output, by the field each of their topics belongs to. The grey slice is everything not listed.
- 1Electrical and Electronic Engineering25% of their works
- 2Computational Mechanics16% of their works
- 3Materials Chemistry14% of their works
- 4Condensed Matter Physics9% of their works
- 5Surfaces, Coatings and Films9% of their works
- 6Radiation7% of their works
Research topics
- Ion-surface interactions and analysis
- Semiconductor materials and devices
- Electron and X-Ray Spectroscopy Techniques
- GaN-based semiconductor devices and materials
- Ga2O3 and related materials
- Silicon Carbide Semiconductor Technologies
- Integrated Circuits and Semiconductor Failure Analysis
- Graphene research and applications
Which keywords describe Tomoaki Nishimura's research?
The keywords of their largest research topics: Ion Beam, Surface Analysis, Atomic Layer Deposition, High-k Dielectrics, III-Nitrides, Power Devices, Scanning Electron Microscopy and Semiconductors.
- Two-Dimensional Materials
- Integrated Circuits
- Failure Analysis
- Gallium Oxide
- Semiconductors
- Power Devices
- High-k Dielectrics
- Surface Analysis
- Ion Beam
- Atomic Layer Deposition
- III-Nitrides
- Scanning Electron Microscopy
- X-ray Photoelectron Spectroscopy
- Semiconductor
- Graphene
- Reliability
- Wide Bandgap Semiconductors
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- Ion Beam91 topic
- Surface Analysis91 topic
- Atomic Layer Deposition71 topic
- High-k Dielectrics71 topic
- III-Nitrides51 topic
- Power Devices52 topics
- Scanning Electron Microscopy51 topic
- Semiconductors51 topic
- X-ray Photoelectron Spectroscopy51 topic
- Gallium Oxide31 topic
- Semiconductor31 topic
- Failure Analysis21 topic
- Graphene21 topic
- Integrated Circuits21 topic
- Reliability21 topic
- Two-Dimensional Materials21 topic
- Wide Bandgap Semiconductors21 topic
Where does Tomoaki Nishimura work?
Tomoaki Nishimura's main affiliation in the publication record is Hosei University, Japan.
How many publications and citations does Tomoaki Nishimura have?
Science Explorer counts 41 works and 58 citations for Tomoaki Nishimura, ranking #1,134,720 of 1,633,909 researchers worldwide on the composite score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics are in the interactive view on the map. Is this your page? Request a correction or removal.