Tomoharu Fujiwara
Tomoharu Fujiwara publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films, on topics such as Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques and Advanced Surface Polishing Techniques.
- World rank
- #1,165,239 of 1,633,909 ranked researchers
- Rank in United States
- #290,394 of 358,040
- Works
- 15
- Citations
- 20
- Citations per work
- 1.3
What does Tomoharu Fujiwara research?
Shares of their own output, by the field each of their topics belongs to. The grey slice is everything not listed.
- 1Electrical and Electronic Engineering50% of their works
- 2Biomedical Engineering22% of their works
- 3Surfaces, Coatings and Films17% of their works
- 4Industrial and Manufacturing Engineering6% of their works
- 5Materials Chemistry6% of their works
Research topics
- Advancements in Photolithography Techniques
- Electron and X-Ray Spectroscopy Techniques
- Advanced Surface Polishing Techniques
- Nanofabrication and Lithography Techniques
- Plasma Diagnostics and Applications
- Integrated Circuits and Semiconductor Failure Analysis
- 3D IC and TSV technologies
- Industrial Vision Systems and Defect Detection
Which keywords describe Tomoharu Fujiwara's research?
The keywords of their largest research topics: High-Resolution Patterning, Electron Beam Lithography, Nanofabrication, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Chemical Mechanical Planarization, Material Removal Mechanism and Nanolithography.
- Semiconductor Industry
- Machine Vision
- Integrated Circuits
- Fabric Defect Detection
- Nanolithography
- Chemical Mechanical Planarization
- Scanning Electron Microscopy
- Electron Beam Lithography
- High-Resolution Patterning
- Nanofabrication
- X-ray Photoelectron Spectroscopy
- Material Removal Mechanism
- Soft Lithography
- Failure Analysis
- Interconnect
- Plasma Etching
- Through-Silicon Via
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- High-Resolution Patterning82 topics
- Electron Beam Lithography61 topic
- Nanofabrication61 topic
- Scanning Electron Microscopy31 topic
- X-ray Photoelectron Spectroscopy31 topic
- Chemical Mechanical Planarization21 topic
- Material Removal Mechanism21 topic
- Nanolithography21 topic
- Soft Lithography21 topic
- Fabric Defect Detection11 topic
- Failure Analysis11 topic
- Integrated Circuits11 topic
- Interconnect11 topic
- Machine Vision11 topic
- Plasma Etching11 topic
- Semiconductor Industry11 topic
- Through-Silicon Via11 topic
Where does Tomoharu Fujiwara work?
Tomoharu Fujiwara's main affiliation in the publication record is Nikon (United States), United States.
How many publications and citations does Tomoharu Fujiwara have?
Science Explorer counts 15 works and 20 citations for Tomoharu Fujiwara, ranking #1,165,239 of 1,633,909 researchers worldwide on the composite score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics are in the interactive view on the map. Is this your page? Request a correction or removal.