Toshiharu Nakashima
Toshiharu Nakashima publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films, on topics such as Advancements in Photolithography Techniques, Advanced optical system design and Integrated Circuits and Semiconductor Failure Analysis.
- World rank
- #6,249,931 of 7,710,434 ranked researchers
- Rank in Japan
- #242,029 of 383,136
- Works
- 27
- Citations
- 159
- Citations per work
- 5.9
What does Toshiharu Nakashima research?
Toshiharu Nakashima's work is mostly in Engineering (63%), Materials Science (6%), Computer Science (4%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences2072.9%
- Engineering1762.7%
- Materials Science26.4%
- Computer Science13.8%
- Everything else727.1%
- 1Electrical and Electronic Engineering36% of their works
- 2Biomedical Engineering18% of their works
- 3Surfaces, Coatings and Films6% of their works
- 4Media Technology5% of their works
- 5Computer Vision and Pattern Recognition4% of their works
- 6Mechanical Engineering4% of their works
Research topics
- Advancements in Photolithography Techniques
- Advanced optical system design
- Integrated Circuits and Semiconductor Failure Analysis
- Image Processing Techniques and Applications
- Nanofabrication and Lithography Techniques
- Advanced Measurement and Metrology Techniques
- Electron and X-Ray Spectroscopy Techniques
- Optical measurement and interference techniques
Which keywords describe Toshiharu Nakashima's research?
The keywords of their largest research topics: High-Resolution Patterning, Electron Beam Lithography, Nanofabrication, Compound Eyes, Freeform Optics, Autofocusing, Depth Estimation and Failure Analysis.
- Camera Calibration
- Soft Lithography
- Nanolithography
- Dimensional Metrology
- Failure Analysis
- Autofocusing
- Compound Eyes
- Electron Beam Lithography
- High-Resolution Patterning
- Nanofabrication
- Freeform Optics
- Depth Estimation
- Integrated Circuits
- Error Compensation
- Scanning Electron Microscopy
- X-ray Photoelectron Spectroscopy
- Structured Light
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- High-Resolution Patterning232 topics
- Electron Beam Lithography201 topic
- Nanofabrication201 topic
- Compound Eyes91 topic
- Freeform Optics91 topic
- Autofocusing41 topic
- Depth Estimation41 topic
- Failure Analysis41 topic
- Integrated Circuits41 topic
- Dimensional Metrology31 topic
- Error Compensation31 topic
- Nanolithography31 topic
- Scanning Electron Microscopy31 topic
- Soft Lithography31 topic
- X-ray Photoelectron Spectroscopy31 topic
- Camera Calibration21 topic
- Structured Light21 topic
Where does Toshiharu Nakashima work?
Toshiharu Nakashima's main affiliation in the publication record is Nikon (Japan), Japan.
How many publications and citations does Toshiharu Nakashima have?
OpenAlex counts 27 works and 159 citations for Toshiharu Nakashima, an h-index of 7, ranking #6,249,931 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
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