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Researcher · GlobalFoundries (United States) · United States

Walter Kleemeier

Walter Kleemeier publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Mechanics of Materials, on topics such as Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design and Ferroelectric and Negative Capacitance Devices.

OpenAlex
World rank
#2,024,265
of 7,710,434 ranked researchers
Rank in United States
#613,756
of 1,627,098
Works
31
Citations
1.1k
Citations per work
34.6
h-index
14
i10-index 21Top 33% in Electrical and Electronic Engineering
Walter Kleemeier

What does Walter Kleemeier research?

Walter Kleemeier's work is mostly in Engineering (88%), Materials Science (2%), Physics and Astronomy (2%).

Physical Sciences: 29 works · 92.3% of their workEngineering: 27 works · 87.9% of their workElectrical and Electronic Engineering: 23 works · 75.8% of their workBiomedical Engineering: 3 works · 9.9% of their workMechanics of Materials: 1 works · 2.2% of their workMaterials Science: 1 works · 2.2% of their workMaterials Chemistry: 1 works · 2.2% of their workPhysics and Astronomy: 1 works · 2.2% of their workAtomic and Molecular Physics, and Optics: 1 works · 2.2% of their workEverything else: 2 works · 6.6% of their workSocial Sciences: 0 works · 1.1% of their workSocial Sciences: 0 works · 1.1% of their workTransportation: 0 works · 1.1% of their workTHEIR WORKWalter Kleemeier31works
Physical Sciences92%Social Sciences1%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering2787.9%
    2. Materials Science12.2%
    3. Physics and Astronomy12.2%
  2. Everything else26.6%
    1. Social Sciences01.1%
  1. 1Electrical and Electronic Engineering76% of their works
  2. 2Biomedical Engineering10% of their works
  3. 3Mechanics of Materials2% of their works
  4. 4Atomic and Molecular Physics, and Optics2% of their works
  5. 5Materials Chemistry2% of their works
  6. 6Transportation1% of their works

Research topics

Which keywords describe Walter Kleemeier's research?

The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Nanowire Transistors, Tunnel Field-Effect Transistors, Ferroelectricity, Hafnium Oxide, Failure Analysis and Integrated Circuits.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 16 words, with their numbers
  1. Atomic Layer Deposition201 topic
  2. High-k Dielectrics201 topic
  3. Nanowire Transistors181 topic
  4. Tunnel Field-Effect Transistors181 topic
  5. Ferroelectricity61 topic
  6. Hafnium Oxide61 topic
  7. Failure Analysis51 topic
  8. Integrated Circuits51 topic
  9. Reliability51 topic
  10. Wide Bandgap Semiconductors51 topic
  11. Chemical Mechanical Planarization41 topic
  12. Material Removal Mechanism41 topic
  13. Electron Beam Lithography31 topic
  14. Nanofabrication31 topic
  15. Plasmonics31 topic
  16. Thin-Film Transistors31 topic

Where does Walter Kleemeier work?

Walter Kleemeier's main affiliation in the publication record is GlobalFoundries (United States), United States.

How many publications and citations does Walter Kleemeier have?

OpenAlex counts 31 works and 1,074 citations for Walter Kleemeier, an h-index of 14, ranking #2,024,265 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

Discussion

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