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Researcher · Mentor Technologies · United States

John L. Sturtevant

John L. Sturtevant publishes mostly in Electrical and Electronic Engineering, Industrial and Manufacturing Engineering and Surfaces, Coatings and Films, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Industrial Vision Systems and Defect Detection.

ORCID 0009-0003-5506-3463 OpenAlex
World rank
#7,682,365
of 7,710,434 ranked researchers
Rank in United States
#1,624,077
of 1,627,098
Works
110
Citations
526
Citations per work
4.8
h-index
12
i10-index 18Top 41% in Electrical and Electronic Engineering
John L. Sturtevant

What does John L. Sturtevant research?

John L. Sturtevant's work is mostly in Engineering (77%), Materials Science (13%).

Physical Sciences: 98 works · 89.2% of their workEngineering: 84 works · 76.6% of their workElectrical and Electronic Engineering: 56 works · 51.1% of their workIndustrial and Manufacturing Engineering: 14 works · 12.3% of their workBiomedical Engineering: 9 works · 8.2% of their workMechanical Engineering: 6 works · 5.0% of their workMaterials Science: 14 works · 12.6% of their workSurfaces, Coatings and Films: 12 works · 10.7% of their workElectronic, Optical and Magnetic Materials: 2 works · 1.9% of their workEverything else: 12 works · 10.8% of their workTHEIR WORKJohn L.Sturtevant110works
Physical Sciences89%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering8476.6%
    2. Materials Science1412.6%
  2. Everything else1210.8%
  1. 1Electrical and Electronic Engineering51% of their works
  2. 2Industrial and Manufacturing Engineering12% of their works
  3. 3Surfaces, Coatings and Films11% of their works
  4. 4Biomedical Engineering8% of their works
  5. 5Mechanical Engineering5% of their works
  6. 6Electronic, Optical and Magnetic Materials2% of their works

Research topics

Which keywords describe John L. Sturtevant's research?

The keywords of their largest research topics: Electron Beam Lithography, Nanofabrication, Failure Analysis, Integrated Circuits, Fabric Defect Detection, Machine Vision, Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.

All 16 words, with their numbers
  1. Electron Beam Lithography981 topic
  2. Nanofabrication981 topic
  3. Failure Analysis351 topic
  4. Integrated Circuits351 topic
  5. Fabric Defect Detection311 topic
  6. Machine Vision311 topic
  7. Scanning Electron Microscopy271 topic
  8. X-ray Photoelectron Spectroscopy271 topic
  9. Chemical Mechanical Planarization221 topic
  10. Material Removal Mechanism221 topic
  11. Dimensional Metrology81 topic
  12. Error Compensation81 topic
  13. Interconnect81 topic
  14. Silicon81 topic
  15. Solar Cells81 topic
  16. Through-Silicon Via81 topic

Where does John L. Sturtevant work?

John L. Sturtevant's main affiliation in the publication record is Mentor Technologies, United States.

How many publications and citations does John L. Sturtevant have?

OpenAlex counts 110 works and 526 citations for John L. Sturtevant, an h-index of 12, ranking #7,682,365 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

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