Juergen Gramss
Juergen Gramss publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering, on topics such as Advancements in Photolithography Techniques, Advanced Surface Polishing Techniques and Electron and X-Ray Spectroscopy Techniques.
- World rank
- #6,844,639 of 7,710,434 ranked researchers
- Rank in Germany
- #338,552 of 364,343
- Works
- 16
- Citations
- 13
- Citations per work
- 0.8
What does Juergen Gramss research?
Juergen Gramss's work is mostly in Engineering (73%), Materials Science (19%), Medicine (4%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1591.8%
- Engineering1273.0%
- Materials Science318.8%
- Health Sciences14.2%
- Medicine14.2%
- Everything else14.0%
- 1Electrical and Electronic Engineering50% of their works
- 2Surfaces, Coatings and Films19% of their works
- 3Biomedical Engineering19% of their works
- 4Radiology, Nuclear Medicine and Imaging4% of their works
- 5Industrial and Manufacturing Engineering2% of their works
- 6Automotive Engineering2% of their works
Research topics
- Advancements in Photolithography Techniques
- Advanced Surface Polishing Techniques
- Electron and X-Ray Spectroscopy Techniques
- 3D IC and TSV technologies
- Semiconductor materials and devices
- Integrated Circuits and Semiconductor Failure Analysis
- Medical Imaging Techniques and Applications
- Additive Manufacturing and 3D Printing Technologies
Which keywords describe Juergen Gramss's research?
The keywords of their largest research topics: Electron Beam Lithography, Nanofabrication, Chemical Mechanical Planarization, Material Removal Mechanism, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Interconnect and Through-Silicon Via.
- Additive Manufacturing
- PET/CT
- Imaging
- Failure Analysis
- Through-Silicon Via
- X-ray Photoelectron Spectroscopy
- Material Removal Mechanism
- Nanofabrication
- Electron Beam Lithography
- Chemical Mechanical Planarization
- Scanning Electron Microscopy
- Interconnect
- Atomic Layer Deposition
- High-k Dielectrics
- Integrated Circuits
- 3D Printing
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 16 words, with their numbers
- Electron Beam Lithography141 topic
- Nanofabrication141 topic
- Chemical Mechanical Planarization71 topic
- Material Removal Mechanism71 topic
- Scanning Electron Microscopy71 topic
- X-ray Photoelectron Spectroscopy71 topic
- Interconnect31 topic
- Through-Silicon Via31 topic
- Atomic Layer Deposition21 topic
- Failure Analysis21 topic
- High-k Dielectrics21 topic
- Imaging21 topic
- Integrated Circuits21 topic
- PET/CT21 topic
- 3D Printing11 topic
- Additive Manufacturing11 topic
Where does Juergen Gramss work?
Juergen Gramss's main affiliation in the publication record is Vistec Electron Beam (Germany), Germany.
How many publications and citations does Juergen Gramss have?
OpenAlex counts 16 works and 13 citations for Juergen Gramss, an h-index of 3, ranking #6,844,639 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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