Jun Yuan Wu
Jun Yuan Wu publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Electronic, Optical and Magnetic Materials, on topics such as Semiconductor materials and devices, Advanced Surface Polishing Techniques and Advancements in Semiconductor Devices and Circuit Design.
- World rank
- #4,589,448 of 7,710,434 ranked researchers
- Rank in United States
- #1,215,592 of 1,627,098
- Works
- 19
- Citations
- 60
- Citations per work
- 3.2
What does Jun Yuan Wu research?
Jun Yuan Wu's work is mostly in Engineering (72%), Materials Science (14%), Physics and Astronomy (5%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1791.2%
- Engineering1471.9%
- Materials Science314.0%
- Physics and Astronomy15.3%
- Everything else28.8%
- 1Electrical and Electronic Engineering60% of their works
- 2Biomedical Engineering9% of their works
- 3Electronic, Optical and Magnetic Materials7% of their works
- 4Materials Chemistry7% of their works
- 5Nuclear and High Energy Physics5% of their works
- 6Mechanics of Materials4% of their works
Research topics
- Semiconductor materials and devices
- Advanced Surface Polishing Techniques
- Advancements in Semiconductor Devices and Circuit Design
- Integrated Circuits and Semiconductor Failure Analysis
- 3D IC and TSV technologies
- Copper Interconnects and Reliability
- Advancements in Photolithography Techniques
- Ferroelectric and Negative Capacitance Devices
Which keywords describe Jun Yuan Wu's research?
The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Chemical Mechanical Planarization, Material Removal Mechanism, Thin Films, Failure Analysis, Integrated Circuits and Nanowire Transistors.
- Hafnium Oxide
- Electron Beam Lithography
- Microelectronics
- Interconnect
- Nanowire Transistors
- Failure Analysis
- Material Removal Mechanism
- High-k Dielectrics
- Atomic Layer Deposition
- Chemical Mechanical Planarization
- Thin Films
- Integrated Circuits
- Tunnel Field-Effect Transistors
- Low-k Dielectrics
- Through-Silicon Via
- Ferroelectricity
- Nanofabrication
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 17 words, with their numbers
- Atomic Layer Deposition111 topic
- High-k Dielectrics111 topic
- Chemical Mechanical Planarization51 topic
- Material Removal Mechanism51 topic
- Thin Films52 topics
- Failure Analysis41 topic
- Integrated Circuits41 topic
- Nanowire Transistors41 topic
- Tunnel Field-Effect Transistors41 topic
- Interconnect31 topic
- Low-k Dielectrics31 topic
- Microelectronics31 topic
- Through-Silicon Via31 topic
- Electron Beam Lithography21 topic
- Ferroelectricity21 topic
- Hafnium Oxide21 topic
- Nanofabrication21 topic
Where does Jun Yuan Wu work?
Jun Yuan Wu's main affiliation in the publication record is United Microelectronics (United States), United States.
How many publications and citations does Jun Yuan Wu have?
OpenAlex counts 19 works and 60 citations for Jun Yuan Wu, an h-index of 4, ranking #4,589,448 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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