Kars Troost
Kars Troost publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics, on topics such as Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques and Integrated Circuits and Semiconductor Failure Analysis.
- World rank
- #2,273,004 of 7,710,434 ranked researchers
- Rank in Netherlands
- #48,681 of 107,149
- Works
- 37
- Citations
- 831
- Citations per work
- 22.5
What does Kars Troost research?
Kars Troost's work is mostly in Engineering (54%), Materials Science (24%), Physics and Astronomy (11%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3388.9%
- Engineering2053.7%
- Materials Science924.1%
- Physics and Astronomy411.1%
- Everything else411.1%
- 1Electrical and Electronic Engineering46% of their works
- 2Surfaces, Coatings and Films18% of their works
- 3Atomic and Molecular Physics, and Optics8% of their works
- 4Biomedical Engineering7% of their works
- 5Materials Chemistry6% of their works
- 6Radiation3% of their works
Research topics
- Advancements in Photolithography Techniques
- Electron and X-Ray Spectroscopy Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Nanofabrication and Lithography Techniques
- Semiconductor materials and devices
- Advanced X-ray Imaging Techniques
- Advanced Surface Polishing Techniques
- Thermal Radiation and Cooling Technologies
Which keywords describe Kars Troost's research?
The keywords of their largest research topics: High-Resolution Patterning, Electron Beam Lithography, Nanofabrication, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Failure Analysis, Integrated Circuits and Atomic Layer Deposition.
- Material Removal Mechanism
- Chemical Mechanical Planarization
- Soft Lithography
- Nanolithography
- Atomic Layer Deposition
- Failure Analysis
- Scanning Electron Microscopy
- Electron Beam Lithography
- High-Resolution Patterning
- Nanofabrication
- X-ray Photoelectron Spectroscopy
- Integrated Circuits
- High-k Dielectrics
- Phase Retrieval
- X-ray Imaging
- Daytime Radiative Cooling
- Radiative Cooling
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- High-Resolution Patterning272 topics
- Electron Beam Lithography241 topic
- Nanofabrication241 topic
- Scanning Electron Microscopy201 topic
- X-ray Photoelectron Spectroscopy201 topic
- Failure Analysis161 topic
- Integrated Circuits161 topic
- Atomic Layer Deposition31 topic
- High-k Dielectrics31 topic
- Nanolithography31 topic
- Phase Retrieval31 topic
- Soft Lithography31 topic
- X-ray Imaging31 topic
- Chemical Mechanical Planarization21 topic
- Daytime Radiative Cooling21 topic
- Material Removal Mechanism21 topic
- Radiative Cooling21 topic
Where does Kars Troost work?
Kars Troost's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does Kars Troost have?
OpenAlex counts 37 works and 831 citations for Kars Troost, an h-index of 15, ranking #2,273,004 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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