Koji Ashida
Koji Ashida publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials, on topics such as Silicon Carbide Semiconductor Technologies, Copper Interconnects and Reliability and Graphene research and applications.
- World rank
- #7,069,626 of 7,710,434 ranked researchers
- Rank in Japan
- #313,458 of 383,136
- Works
- 21
- Citations
- 164
- Citations per work
- 7.8
What does Koji Ashida research?
Koji Ashida's work is mostly in Engineering (42%), Materials Science (35%), Physics and Astronomy (7%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1783.3%
- Engineering941.6%
- Materials Science735.0%
- Physics and Astronomy16.7%
- Everything else416.7%
- 1Electrical and Electronic Engineering33% of their works
- 2Materials Chemistry18% of their works
- 3Electronic, Optical and Magnetic Materials10% of their works
- 4Biomedical Engineering8% of their works
- 5Surfaces, Coatings and Films7% of their works
- 6Atomic and Molecular Physics, and Optics7% of their works
Research topics
- Silicon Carbide Semiconductor Technologies
- Copper Interconnects and Reliability
- Graphene research and applications
- Diamond and Carbon-based Materials Research
- Electron and X-Ray Spectroscopy Techniques
- Advanced Surface Polishing Techniques
- Thin-Film Transistor Technologies
- Integrated Circuits and Semiconductor Failure Analysis
Which keywords describe Koji Ashida's research?
The keywords of their largest research topics: Reliability, Wide Bandgap Semiconductors, Raman Spectroscopy, Low-k Dielectrics, Microelectronics, Graphene, Nanodiamonds and Quantum Sensing.
- Plasmonics
- Integrated Circuits
- Chemical Mechanical Planarization
- Two-Dimensional Materials
- Quantum Sensing
- Graphene
- Low-k Dielectrics
- Wide Bandgap Semiconductors
- Reliability
- Raman Spectroscopy
- Microelectronics
- Nanodiamonds
- Scanning Electron Microscopy
- X-ray Photoelectron Spectroscopy
- Failure Analysis
- Material Removal Mechanism
- Thin-Film Transistors
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- Reliability111 topic
- Wide Bandgap Semiconductors111 topic
- Raman Spectroscopy82 topics
- Low-k Dielectrics51 topic
- Microelectronics51 topic
- Graphene41 topic
- Nanodiamonds41 topic
- Quantum Sensing41 topic
- Scanning Electron Microscopy41 topic
- Two-Dimensional Materials41 topic
- X-ray Photoelectron Spectroscopy41 topic
- Chemical Mechanical Planarization31 topic
- Failure Analysis31 topic
- Integrated Circuits31 topic
- Material Removal Mechanism31 topic
- Plasmonics31 topic
- Thin-Film Transistors31 topic
Where does Koji Ashida work?
Koji Ashida's main affiliation in the publication record is Kwansei Gakuin University, Japan.
How many publications and citations does Koji Ashida have?
OpenAlex counts 21 works and 164 citations for Koji Ashida, an h-index of 8, ranking #7,069,626 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
Discussion
Ask a question or share a note about Koji Ashida. Posts are plain text and can be reported.