Mark Eurlings
Mark Eurlings publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Industrial and Manufacturing Engineering, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Advanced Surface Polishing Techniques.
- World rank
- #6,417,701 of 7,710,434 ranked researchers
- Rank in Netherlands
- #101,534 of 107,149
- Works
- 17
- Citations
- 152
- Citations per work
- 8.9
What does Mark Eurlings research?
Mark Eurlings's work is mostly in Engineering (71%), Physics and Astronomy (10%), Materials Science (8%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1588.2%
- Engineering1270.6%
- Physics and Astronomy29.8%
- Materials Science17.8%
- Everything else211.8%
- 1Electrical and Electronic Engineering51% of their works
- 2Biomedical Engineering12% of their works
- 3Industrial and Manufacturing Engineering8% of their works
- 4Surfaces, Coatings and Films8% of their works
- 5Atomic and Molecular Physics, and Optics6% of their works
- 6Condensed Matter Physics4% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Advanced Surface Polishing Techniques
- Industrial Vision Systems and Defect Detection
- Optical measurement and interference techniques
- Plasma Diagnostics and Applications
- 3D IC and TSV technologies
- Electron and X-Ray Spectroscopy Techniques
Which keywords describe Mark Eurlings's research?
The keywords of their largest research topics: Electron Beam Lithography, Nanofabrication, Failure Analysis, Integrated Circuits, Chemical Mechanical Planarization, Fabric Defect Detection, Machine Vision and Material Removal Mechanism.
- X-ray Photoelectron Spectroscopy
- Structured Light
- Scanning Electron Microscopy
- Interconnect
- Material Removal Mechanism
- Fabric Defect Detection
- Integrated Circuits
- Nanofabrication
- Electron Beam Lithography
- Failure Analysis
- Chemical Mechanical Planarization
- Machine Vision
- Camera Calibration
- Plasma Etching
- Semiconductor Industry
- Through-Silicon Via
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 16 words, with their numbers
- Electron Beam Lithography151 topic
- Nanofabrication151 topic
- Failure Analysis61 topic
- Integrated Circuits61 topic
- Chemical Mechanical Planarization31 topic
- Fabric Defect Detection31 topic
- Machine Vision31 topic
- Material Removal Mechanism31 topic
- Camera Calibration21 topic
- Interconnect21 topic
- Plasma Etching21 topic
- Scanning Electron Microscopy21 topic
- Semiconductor Industry21 topic
- Structured Light21 topic
- Through-Silicon Via21 topic
- X-ray Photoelectron Spectroscopy21 topic
Where does Mark Eurlings work?
Mark Eurlings's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does Mark Eurlings have?
OpenAlex counts 17 works and 152 citations for Mark Eurlings, an h-index of 7, ranking #6,417,701 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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