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Researcher · Intersil (United States) · United States

Michael J. Dion

Michael J. Dion publishes mostly in Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Industrial and Manufacturing Engineering, on topics such as Semiconductor materials and devices, Copper Interconnects and Reliability and Integrated Circuits and Semiconductor Failure Analysis.

OpenAlex
World rank
#6,826,049
of 7,710,434 ranked researchers
Rank in United States
#1,559,145
of 1,627,098
Works
19
Citations
58
Citations per work
3.1
h-index
5
i10-index 2Top 89% in Electrical and Electronic Engineering
Michael J. Dion

What does Michael J. Dion research?

Michael J. Dion's work is mostly in Engineering (69%), Materials Science (20%), Physics and Astronomy (4%).

Physical Sciences: 18 works · 92.7% of their workEngineering: 13 works · 68.6% of their workElectrical and Electronic Engineering: 11 works · 55.6% of their workIndustrial and Manufacturing Engineering: 1 works · 5.6% of their workCivil and Structural Engineering: 1 works · 3.7% of their workMechanics of Materials: 1 works · 3.7% of their workMaterials Science: 4 works · 20.4% of their workElectronic, Optical and Magnetic Materials: 4 works · 20.4% of their workPhysics and Astronomy: 1 works · 3.7% of their workAtomic and Molecular Physics, and Optics: 1 works · 3.7% of their workEverything else: 1 works · 7.3% of their workTHEIR WORKMichael J. Dion19works
Physical Sciences93%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering1368.6%
    2. Materials Science420.4%
    3. Physics and Astronomy13.7%
  2. Everything else17.3%
  1. 1Electrical and Electronic Engineering56% of their works
  2. 2Electronic, Optical and Magnetic Materials20% of their works
  3. 3Industrial and Manufacturing Engineering6% of their works
  4. 4Mechanics of Materials4% of their works
  5. 5Civil and Structural Engineering4% of their works
  6. 6Atomic and Molecular Physics, and Optics4% of their works

Research topics

Which keywords describe Michael J. Dion's research?

The keywords of their largest research topics: Electromigration, Nanoelectronics, Thin Films, Atomic Layer Deposition, High-k Dielectrics, Low-k Dielectrics, Microelectronics and Failure Analysis.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 19 words, with their numbers
  1. Electromigration162 topics
  2. Nanoelectronics132 topics
  3. Thin Films132 topics
  4. Atomic Layer Deposition111 topic
  5. High-k Dielectrics111 topic
  6. Low-k Dielectrics111 topic
  7. Microelectronics111 topic
  8. Failure Analysis61 topic
  9. Integrated Circuits61 topic
  10. Interfacial Reactions51 topic
  11. Lead-free Solders51 topic
  12. Coatings21 topic
  13. Metal-Semiconductor Contacts21 topic
  14. Nanoindentation21 topic
  15. Radiation Effects21 topic
  16. Schottky Barrier21 topic
  17. Soft Errors21 topic
  18. Embedded Cores11 topic
  19. Test Data Compression11 topic

Where does Michael J. Dion work?

Michael J. Dion's main affiliation in the publication record is Intersil (United States), United States.

How many publications and citations does Michael J. Dion have?

OpenAlex counts 19 works and 58 citations for Michael J. Dion, an h-index of 5, ranking #6,826,049 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

Discussion

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