Nobuhito Toyama
Nobuhito Toyama publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films, on topics such as Advancements in Photolithography Techniques, Nanofabrication and Lithography Techniques and Advanced Surface Polishing Techniques.
- World rank
- #6,815,898 of 7,710,434 ranked researchers
- Rank in Japan
- #290,198 of 383,136
- Works
- 38
- Citations
- 143
- Citations per work
- 3.8
What does Nobuhito Toyama research?
Nobuhito Toyama's work is mostly in Engineering (74%), Materials Science (7%), Physics and Astronomy (4%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3285.4%
- Engineering2874.4%
- Materials Science37.3%
- Physics and Astronomy13.7%
- Everything else614.6%
- 1Electrical and Electronic Engineering40% of their works
- 2Biomedical Engineering25% of their works
- 3Surfaces, Coatings and Films7% of their works
- 4Computational Mechanics6% of their works
- 5Industrial and Manufacturing Engineering4% of their works
- 6Atomic and Molecular Physics, and Optics4% of their works
Research topics
- Advancements in Photolithography Techniques
- Nanofabrication and Lithography Techniques
- Advanced Surface Polishing Techniques
- 3D IC and TSV technologies
- Electron and X-Ray Spectroscopy Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Advanced optical system design
- Surface Roughness and Optical Measurements
Which keywords describe Nobuhito Toyama's research?
The keywords of their largest research topics: High-Resolution Patterning, Electron Beam Lithography, Nanofabrication, Nanolithography, Soft Lithography, Chemical Mechanical Planarization, Material Removal Mechanism and Interconnect.
- Roughness Measurement
- Compound Eyes
- Failure Analysis
- Through-Silicon Via
- Interconnect
- Chemical Mechanical Planarization
- Nanolithography
- Electron Beam Lithography
- High-Resolution Patterning
- Nanofabrication
- Soft Lithography
- Material Removal Mechanism
- Scanning Electron Microscopy
- X-ray Photoelectron Spectroscopy
- Integrated Circuits
- Freeform Optics
- Surface Characterization
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- High-Resolution Patterning442 topics
- Electron Beam Lithography311 topic
- Nanofabrication311 topic
- Nanolithography131 topic
- Soft Lithography131 topic
- Chemical Mechanical Planarization91 topic
- Material Removal Mechanism91 topic
- Interconnect61 topic
- Scanning Electron Microscopy61 topic
- Through-Silicon Via61 topic
- X-ray Photoelectron Spectroscopy61 topic
- Failure Analysis51 topic
- Integrated Circuits51 topic
- Compound Eyes41 topic
- Freeform Optics41 topic
- Roughness Measurement41 topic
- Surface Characterization41 topic
Where does Nobuhito Toyama work?
Nobuhito Toyama's main affiliation in the publication record is Dai Nippon Printing (Japan), Japan.
How many publications and citations does Nobuhito Toyama have?
OpenAlex counts 38 works and 143 citations for Nobuhito Toyama, an h-index of 5, ranking #6,815,898 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
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