Peter Nikolsky
Peter Nikolsky publishes mostly in Electrical and Electronic Engineering, Industrial and Manufacturing Engineering and Surfaces, Coatings and Films, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Industrial Vision Systems and Defect Detection.
- World rank
- #4,815,339 of 7,710,434 ranked researchers
- Rank in Netherlands
- #86,833 of 107,149
- Works
- 21
- Citations
- 156
- Citations per work
- 7.4
What does Peter Nikolsky research?
Peter Nikolsky's work is mostly in Engineering (84%), Materials Science (13%), Computer Science (2%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences2198.4%
- Engineering1884.1%
- Materials Science312.7%
- Computer Science01.6%
- 1Electrical and Electronic Engineering60% of their works
- 2Industrial and Manufacturing Engineering14% of their works
- 3Surfaces, Coatings and Films13% of their works
- 4Biomedical Engineering8% of their works
- 5Computer Vision and Pattern Recognition2% of their works
- 6Mechanical Engineering2% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Industrial Vision Systems and Defect Detection
- Electron and X-Ray Spectroscopy Techniques
- Advanced Surface Polishing Techniques
- 3D IC and TSV technologies
- Semiconductor materials and devices
- Optical measurement and interference techniques
Which keywords describe Peter Nikolsky's research?
The keywords of their largest research topics: Electron Beam Lithography, Nanofabrication, Failure Analysis, Integrated Circuits, Fabric Defect Detection, Machine Vision, Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy.
- Structured Light
- High-k Dielectrics
- Through-Silicon Via
- Interconnect
- X-ray Photoelectron Spectroscopy
- Machine Vision
- Integrated Circuits
- Nanofabrication
- Electron Beam Lithography
- Failure Analysis
- Fabric Defect Detection
- Scanning Electron Microscopy
- Chemical Mechanical Planarization
- Material Removal Mechanism
- Atomic Layer Deposition
- Camera Calibration
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 16 words, with their numbers
- Electron Beam Lithography211 topic
- Nanofabrication211 topic
- Failure Analysis91 topic
- Integrated Circuits91 topic
- Fabric Defect Detection81 topic
- Machine Vision81 topic
- Scanning Electron Microscopy71 topic
- X-ray Photoelectron Spectroscopy71 topic
- Chemical Mechanical Planarization41 topic
- Interconnect41 topic
- Material Removal Mechanism41 topic
- Through-Silicon Via41 topic
- Atomic Layer Deposition21 topic
- High-k Dielectrics21 topic
- Camera Calibration11 topic
- Structured Light11 topic
Where does Peter Nikolsky work?
Peter Nikolsky's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does Peter Nikolsky have?
OpenAlex counts 21 works and 156 citations for Peter Nikolsky, an h-index of 6, ranking #4,815,339 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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