Tzung-Hua Ying
Tzung-Hua Ying publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Electronic, Optical and Magnetic Materials, on topics such as Semiconductor materials and devices, Advancements in Photolithography Techniques and Copper Interconnects and Reliability.
- World rank
- #5,613,824 of 7,710,434 ranked researchers
- Rank in Taiwan
- #43,329 of 57,035
- Works
- 24
- Citations
- 161
- Citations per work
- 6.7
What does Tzung-Hua Ying research?
Tzung-Hua Ying's work is mostly in Engineering (62%), Materials Science (18%), Physics and Astronomy (8%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences2188.8%
- Engineering1562.5%
- Materials Science418.0%
- Physics and Astronomy28.3%
- Everything else311.2%
- 1Electrical and Electronic Engineering47% of their works
- 2Biomedical Engineering11% of their works
- 3Electronic, Optical and Magnetic Materials10% of their works
- 4Surfaces, Coatings and Films8% of their works
- 5Radiation8% of their works
- 6Mechanics of Materials4% of their works
Research topics
- Semiconductor materials and devices
- Advancements in Photolithography Techniques
- Copper Interconnects and Reliability
- Advanced Surface Polishing Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- 3D IC and TSV technologies
- Advancements in Semiconductor Devices and Circuit Design
- Metal and Thin Film Mechanics
Which keywords describe Tzung-Hua Ying's research?
The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Thin Films, Electron Beam Lithography, Low-k Dielectrics, Microelectronics, Nanofabrication and Chemical Mechanical Planarization.
- Nanowire Transistors
- Coatings
- Interconnect
- Failure Analysis
- Chemical Mechanical Planarization
- Microelectronics
- Electron Beam Lithography
- High-k Dielectrics
- Atomic Layer Deposition
- Thin Films
- Low-k Dielectrics
- Nanofabrication
- Material Removal Mechanism
- Integrated Circuits
- Through-Silicon Via
- Nanoindentation
- Tunnel Field-Effect Transistors
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 17 words, with their numbers
- Atomic Layer Deposition111 topic
- High-k Dielectrics111 topic
- Thin Films102 topics
- Electron Beam Lithography71 topic
- Low-k Dielectrics71 topic
- Microelectronics71 topic
- Nanofabrication71 topic
- Chemical Mechanical Planarization61 topic
- Material Removal Mechanism61 topic
- Failure Analysis41 topic
- Integrated Circuits41 topic
- Interconnect41 topic
- Through-Silicon Via41 topic
- Coatings31 topic
- Nanoindentation31 topic
- Nanowire Transistors31 topic
- Tunnel Field-Effect Transistors31 topic
Where does Tzung-Hua Ying work?
Tzung-Hua Ying's main affiliation in the publication record is Powerchip (Taiwan), Taiwan.
How many publications and citations does Tzung-Hua Ying have?
OpenAlex counts 24 works and 161 citations for Tzung-Hua Ying, an h-index of 7, ranking #5,613,824 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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