Wallace Wan-Li Lin
Wallace Wan-Li Lin publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics, on topics such as Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design and Integrated Circuits and Semiconductor Failure Analysis.
- World rank
- #7,397,610 of 7,710,434 ranked researchers
- Rank in United States
- #1,606,091 of 1,627,098
- Works
- 32
- Citations
- 192
- Citations per work
- 6.0
What does Wallace Wan-Li Lin research?
Wallace Wan-Li Lin's work is mostly in Engineering (85%), Materials Science (8%), Physics and Astronomy (3%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3196.8%
- Engineering2785.0%
- Materials Science27.5%
- Physics and Astronomy13.2%
- Computer Science01.1%
- Everything else13.2%
- 1Electrical and Electronic Engineering84% of their works
- 2Surfaces, Coatings and Films4% of their works
- 3Atomic and Molecular Physics, and Optics3% of their works
- 4Materials Chemistry3% of their works
- 5Hardware and Architecture1% of their works
- 6Industrial and Manufacturing Engineering1% of their works
Research topics
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Integrated Circuits and Semiconductor Failure Analysis
- Electron and X-Ray Spectroscopy Techniques
- Electrostatic Discharge in Electronics
- Silicon and Solar Cell Technologies
- Ferroelectric and Negative Capacitance Devices
- Semiconductor materials and interfaces
Which keywords describe Wallace Wan-Li Lin's research?
The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Nanowire Transistors, Tunnel Field-Effect Transistors, Failure Analysis, Integrated Circuits, Solar Cells and Scanning Electron Microscopy.
- Schottky Barrier
- Hafnium Oxide
- Efficiency
- CMOS Technology
- Scanning Electron Microscopy
- Integrated Circuits
- Tunnel Field-Effect Transistors
- High-k Dielectrics
- Atomic Layer Deposition
- Nanowire Transistors
- Failure Analysis
- Solar Cells
- X-ray Photoelectron Spectroscopy
- ESD Protection
- Ferroelectricity
- Metal-Semiconductor Contacts
- Silicon
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- Atomic Layer Deposition261 topic
- High-k Dielectrics261 topic
- Nanowire Transistors191 topic
- Tunnel Field-Effect Transistors191 topic
- Failure Analysis111 topic
- Integrated Circuits111 topic
- Solar Cells62 topics
- Scanning Electron Microscopy41 topic
- X-ray Photoelectron Spectroscopy41 topic
- CMOS Technology31 topic
- ESD Protection31 topic
- Efficiency31 topic
- Ferroelectricity31 topic
- Hafnium Oxide31 topic
- Metal-Semiconductor Contacts31 topic
- Schottky Barrier31 topic
- Silicon31 topic
Where does Wallace Wan-Li Lin work?
Wallace Wan-Li Lin's main affiliation in the publication record is Intel (United States), United States.
How many publications and citations does Wallace Wan-Li Lin have?
OpenAlex counts 32 works and 192 citations for Wallace Wan-Li Lin, an h-index of 9, ranking #7,397,610 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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