William J. Roesch
William J. Roesch publishes mostly in Electrical and Electronic Engineering, Industrial and Manufacturing Engineering and Electronic, Optical and Magnetic Materials, on topics such as Semiconductor materials and devices, Electronic Packaging and Soldering Technologies and Integrated Circuits and Semiconductor Failure Analysis.
- World rank
- #1,320,839 of 1,633,909 ranked researchers
- Rank in United States
- #313,975 of 358,040
- Works
- 15
- Citations
- 29
- Citations per work
- 1.9
What does William J. Roesch research?
Shares of their own output, by the field each of their topics belongs to. The grey slice is everything not listed.
- 1Electrical and Electronic Engineering64% of their works
- 2Industrial and Manufacturing Engineering8% of their works
- 3Electronic, Optical and Magnetic Materials8% of their works
- 4Hardware and Architecture4% of their works
- 5Mechanical Engineering4% of their works
- 6Safety, Risk, Reliability and Quality4% of their works
Research topics
- Semiconductor materials and devices
- Electronic Packaging and Soldering Technologies
- Integrated Circuits and Semiconductor Failure Analysis
- Electrostatic Discharge in Electronics
- Copper Interconnects and Reliability
- VLSI and Analog Circuit Testing
- Electromagnetic Compatibility and Measurements
- Advancements in Semiconductor Devices and Circuit Design
Which keywords describe William J. Roesch's research?
The keywords of their largest research topics: Electromigration, Atomic Layer Deposition, High-k Dielectrics, Failure Analysis, Integrated Circuits, Interfacial Reactions, Lead-free Solders and CMOS Technology.
- Test Data Compression
- Nanowire Transistors
- Antenna Measurement
- Low-k Dielectrics
- CMOS Technology
- Interfacial Reactions
- Failure Analysis
- Atomic Layer Deposition
- Electromigration
- High-k Dielectrics
- Integrated Circuits
- Lead-free Solders
- ESD Protection
- Microelectronics
- Embedded Cores
- Reverberation Chambers
- Tunnel Field-Effect Transistors
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- Electromigration52 topics
- Atomic Layer Deposition41 topic
- High-k Dielectrics41 topic
- Failure Analysis31 topic
- Integrated Circuits31 topic
- Interfacial Reactions31 topic
- Lead-free Solders31 topic
- CMOS Technology21 topic
- ESD Protection21 topic
- Low-k Dielectrics21 topic
- Microelectronics21 topic
- Antenna Measurement11 topic
- Embedded Cores11 topic
- Nanowire Transistors11 topic
- Reverberation Chambers11 topic
- Test Data Compression11 topic
- Tunnel Field-Effect Transistors11 topic
Where does William J. Roesch work?
William J. Roesch's main affiliation in the publication record is Qorvo (United States), United States.
How many publications and citations does William J. Roesch have?
Science Explorer counts 15 works and 29 citations for William J. Roesch, ranking #1,320,839 of 1,633,909 researchers worldwide on the composite score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics are in the interactive view on the map. Is this your page? Request a correction or removal.