Wolfgang Fallmann
Wolfgang Fallmann publishes mostly in Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Materials Chemistry, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Ion-surface interactions and analysis.
- World rank
- #7,059,544 of 7,710,434 ranked researchers
- Rank in Austria
- #41,010 of 43,330
- Works
- 43
- Citations
- 326
- Citations per work
- 7.6
What does Wolfgang Fallmann research?
Wolfgang Fallmann's work is mostly in Engineering (46%), Materials Science (15%), Physics and Astronomy (12%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3172.8%
- Engineering2045.5%
- Materials Science614.9%
- Physics and Astronomy512.4%
- Everything else1227.2%
- 1Electrical and Electronic Engineering31% of their works
- 2Atomic and Molecular Physics, and Optics12% of their works
- 3Materials Chemistry8% of their works
- 4Computational Mechanics8% of their works
- 5Surfaces, Coatings and Films7% of their works
- 6Biomedical Engineering6% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Ion-surface interactions and analysis
- Semiconductor materials and devices
- Electron and X-Ray Spectroscopy Techniques
- Nanofabrication and Lithography Techniques
- Metal and Thin Film Mechanics
- Diamond and Carbon-based Materials Research
Which keywords describe Wolfgang Fallmann's research?
The keywords of their largest research topics: High-Resolution Patterning, Electron Beam Lithography, Nanofabrication, Nanoscale Patterning, Failure Analysis, Integrated Circuits, X-ray Photoelectron Spectroscopy and Ion Beam.
- Soft Lithography
- Nanolithography
- Nanodiamonds
- High-k Dielectrics
- Atomic Layer Deposition
- Ion Beam
- Integrated Circuits
- Nanoscale Patterning
- Electron Beam Lithography
- High-Resolution Patterning
- Nanofabrication
- Failure Analysis
- X-ray Photoelectron Spectroscopy
- Surface Analysis
- Electron Inelastic Mean Free Paths
- Scanning Electron Microscopy
- Nanoindentation
- Quantum Sensing
- Thin Films
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 19 words, with their numbers
- High-Resolution Patterning192 topics
- Electron Beam Lithography151 topic
- Nanofabrication151 topic
- Nanoscale Patterning132 topics
- Failure Analysis101 topic
- Integrated Circuits101 topic
- X-ray Photoelectron Spectroscopy102 topics
- Ion Beam91 topic
- Surface Analysis91 topic
- Atomic Layer Deposition61 topic
- Electron Inelastic Mean Free Paths61 topic
- High-k Dielectrics61 topic
- Scanning Electron Microscopy61 topic
- Nanodiamonds41 topic
- Nanoindentation41 topic
- Nanolithography41 topic
- Quantum Sensing41 topic
- Soft Lithography41 topic
- Thin Films41 topic
Where does Wolfgang Fallmann work?
Wolfgang Fallmann's main affiliation in the publication record is TU Wien, Austria.
How many publications and citations does Wolfgang Fallmann have?
OpenAlex counts 43 works and 326 citations for Wolfgang Fallmann, an h-index of 10, ranking #7,059,544 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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