Benjamin Szu-Min Lin
Benjamin Szu-Min Lin publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Advanced Surface Polishing Techniques.
- World rank
- #7,525,868 of 7,710,434 ranked researchers
- Rank in Taiwan
- #56,253 of 57,035
- Works
- 41
- Citations
- 111
- Citations per work
- 2.7
What does Benjamin Szu-Min Lin research?
Benjamin Szu-Min Lin's work is mostly in Engineering (69%), Materials Science (8%), Physics and Astronomy (7%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3483.5%
- Engineering2868.6%
- Materials Science38.3%
- Physics and Astronomy36.6%
- Everything else716.5%
- 1Electrical and Electronic Engineering47% of their works
- 2Biomedical Engineering16% of their works
- 3Surfaces, Coatings and Films8% of their works
- 4Atomic and Molecular Physics, and Optics7% of their works
- 5Mechanical Engineering2% of their works
- 6Mechanics of Materials2% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Advanced Surface Polishing Techniques
- Electron and X-Ray Spectroscopy Techniques
- Advanced optical system design
- Nanofabrication and Lithography Techniques
- 3D IC and TSV technologies
- Industrial Vision Systems and Defect Detection
Which keywords describe Benjamin Szu-Min Lin's research?
The keywords of their largest research topics: High-Resolution Patterning, Electron Beam Lithography, Nanofabrication, Failure Analysis, Integrated Circuits, Chemical Mechanical Planarization, Material Removal Mechanism and Scanning Electron Microscopy.
- Machine Vision
- Fabric Defect Detection
- Nanolithography
- Compound Eyes
- Scanning Electron Microscopy
- Chemical Mechanical Planarization
- Failure Analysis
- Electron Beam Lithography
- High-Resolution Patterning
- Nanofabrication
- Integrated Circuits
- Material Removal Mechanism
- X-ray Photoelectron Spectroscopy
- Freeform Optics
- Soft Lithography
- Interconnect
- Through-Silicon Via
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 17 words, with their numbers
- High-Resolution Patterning352 topics
- Electron Beam Lithography311 topic
- Nanofabrication311 topic
- Failure Analysis171 topic
- Integrated Circuits171 topic
- Chemical Mechanical Planarization101 topic
- Material Removal Mechanism101 topic
- Scanning Electron Microscopy71 topic
- X-ray Photoelectron Spectroscopy71 topic
- Compound Eyes51 topic
- Freeform Optics51 topic
- Nanolithography41 topic
- Soft Lithography41 topic
- Fabric Defect Detection31 topic
- Interconnect31 topic
- Machine Vision31 topic
- Through-Silicon Via31 topic
Where does Benjamin Szu-Min Lin work?
Benjamin Szu-Min Lin's main affiliation in the publication record is United Microelectronics (Taiwan), Taiwan.
How many publications and citations does Benjamin Szu-Min Lin have?
OpenAlex counts 41 works and 111 citations for Benjamin Szu-Min Lin, an h-index of 5, ranking #7,525,868 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Other researchers named Benjamin Szu-Min Lin
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