Donald J. Samuels
Donald J. Samuels publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Computational Mechanics, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Advanced Surface Polishing Techniques.
- World rank
- #5,925,288 of 7,710,434 ranked researchers
- Rank in United States
- #1,451,134 of 1,627,098
- Works
- 23
- Citations
- 237
- Citations per work
- 10.3
What does Donald J. Samuels research?
Donald J. Samuels's work is mostly in Engineering (77%), Materials Science (5%), Business, Management and Accounting (5%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1981.5%
- Engineering1876.9%
- Materials Science14.6%
- Everything else313.9%
- Social Sciences14.6%
- 1Electrical and Electronic Engineering57% of their works
- 2Biomedical Engineering11% of their works
- 3Computational Mechanics5% of their works
- 4Surfaces, Coatings and Films5% of their works
- 5Industrial and Manufacturing Engineering5% of their works
- 6Strategy and Management5% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Advanced Surface Polishing Techniques
- Nanofabrication and Lithography Techniques
- Surface Roughness and Optical Measurements
- Industrial Vision Systems and Defect Detection
- Electron and X-Ray Spectroscopy Techniques
- VLSI and Analog Circuit Testing
Which keywords describe Donald J. Samuels's research?
The keywords of their largest research topics: High-Resolution Patterning, Electron Beam Lithography, Nanofabrication, Failure Analysis, Integrated Circuits, Machine Vision, Chemical Mechanical Planarization and Fabric Defect Detection.
- Test Data Compression
- X-ray Photoelectron Spectroscopy
- Surface Characterization
- Scanning Electron Microscopy
- Nanolithography
- Fabric Defect Detection
- Machine Vision
- Failure Analysis
- Electron Beam Lithography
- High-Resolution Patterning
- Nanofabrication
- Integrated Circuits
- Chemical Mechanical Planarization
- Material Removal Mechanism
- Roughness Measurement
- Soft Lithography
- Texture Analysis
- Embedded Cores
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 18 words, with their numbers
- High-Resolution Patterning232 topics
- Electron Beam Lithography201 topic
- Nanofabrication201 topic
- Failure Analysis71 topic
- Integrated Circuits71 topic
- Machine Vision62 topics
- Chemical Mechanical Planarization31 topic
- Fabric Defect Detection31 topic
- Material Removal Mechanism31 topic
- Nanolithography31 topic
- Roughness Measurement31 topic
- Scanning Electron Microscopy31 topic
- Soft Lithography31 topic
- Surface Characterization31 topic
- Texture Analysis31 topic
- X-ray Photoelectron Spectroscopy31 topic
- Embedded Cores21 topic
- Test Data Compression21 topic
Where does Donald J. Samuels work?
Donald J. Samuels's main affiliation in the publication record is IBM (United States), United States.
How many publications and citations does Donald J. Samuels have?
OpenAlex counts 23 works and 237 citations for Donald J. Samuels, an h-index of 5, ranking #5,925,288 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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