George K. C. Huang
George K. C. Huang publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Electron and X-Ray Spectroscopy Techniques.
- World rank
- #6,759,039 of 7,710,434 ranked researchers
- Rank in Taiwan
- #51,595 of 57,035
- Works
- 15
- Citations
- 94
- Citations per work
- 6.3
What does George K. C. Huang research?
George K. C. Huang's work is mostly in Engineering (80%), Materials Science (16%), Computer Science (2%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1597.7%
- Engineering1279.9%
- Materials Science215.6%
- Computer Science02.2%
- 1Electrical and Electronic Engineering64% of their works
- 2Surfaces, Coatings and Films16% of their works
- 3Biomedical Engineering7% of their works
- 4Mechanical Engineering4% of their works
- 5Industrial and Manufacturing Engineering4% of their works
- 6Hardware and Architecture2% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
- VLSI and Analog Circuit Testing
- Advanced Surface Polishing Techniques
- Nanofabrication and Lithography Techniques
- Near-Field Optical Microscopy
Which keywords describe George K. C. Huang's research?
The keywords of their largest research topics: Nanofabrication, High-Resolution Patterning, Electron Beam Lithography, Resolution Limits, Failure Analysis, Integrated Circuits, Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy.
- Test Data Compression
- Photonic Nanojets
- Nanolithography
- Embedded Cores
- Nanostructures
- X-ray Photoelectron Spectroscopy
- Integrated Circuits
- Resolution Limits
- High-Resolution Patterning
- Nanofabrication
- Electron Beam Lithography
- Failure Analysis
- Scanning Electron Microscopy
- Antireflective Coatings
- Chemical Mechanical Planarization
- Material Removal Mechanism
- Near-Field Optical Microscopy
- Soft Lithography
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 18 words, with their numbers
- Nanofabrication182 topics
- High-Resolution Patterning162 topics
- Electron Beam Lithography151 topic
- Resolution Limits151 topic
- Failure Analysis111 topic
- Integrated Circuits111 topic
- Scanning Electron Microscopy41 topic
- X-ray Photoelectron Spectroscopy41 topic
- Antireflective Coatings31 topic
- Nanostructures31 topic
- Chemical Mechanical Planarization11 topic
- Embedded Cores11 topic
- Material Removal Mechanism11 topic
- Nanolithography11 topic
- Near-Field Optical Microscopy11 topic
- Photonic Nanojets11 topic
- Soft Lithography11 topic
- Test Data Compression11 topic
Where does George K. C. Huang work?
George K. C. Huang's main affiliation in the publication record is United Microelectronics (Taiwan), Taiwan.
How many publications and citations does George K. C. Huang have?
OpenAlex counts 15 works and 94 citations for George K. C. Huang, an h-index of 6, ranking #6,759,039 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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