K. Mistry
K. Mistry publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Hardware and Architecture, on topics such as Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design and Integrated Circuits and Semiconductor Failure Analysis.
- World rank
- #258,278 of 7,710,434 ranked researchers
- Rank in United States
- #94,769 of 1,627,098
- Works
- 74
- Citations
- 6.4k
- Citations per work
- 86.0
What does K. Mistry research?
K. Mistry's work is mostly in Engineering (91%), Computer Science (2%), Materials Science (1%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences7095.2%
- Engineering6790.6%
- Computer Science11.8%
- Materials Science11.4%
- Physics and Astronomy11.4%
- Everything else44.8%
- 1Electrical and Electronic Engineering87% of their works
- 2Biomedical Engineering3% of their works
- 3Hardware and Architecture2% of their works
- 4Atomic and Molecular Physics, and Optics1% of their works
- 5Electronic, Optical and Magnetic Materials1% of their works
- 6Industrial and Manufacturing Engineering0% of their works
Research topics
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Integrated Circuits and Semiconductor Failure Analysis
- Ferroelectric and Negative Capacitance Devices
- Silicon Carbide Semiconductor Technologies
- Nanowire Synthesis and Applications
- Low-power high-performance VLSI design
- Electrostatic Discharge in Electronics
Which keywords describe K. Mistry's research?
The keywords of their largest research topics: Process Variation, Atomic Layer Deposition, High-k Dielectrics, Nanowire Transistors, Tunnel Field-Effect Transistors, Failure Analysis, Integrated Circuits and CMOS Technology.
- SCR Devices
- VLSI Circuits
- Nanosensors
- Wide Bandgap Semiconductors
- Hafnium Oxide
- CMOS Technology
- Failure Analysis
- Nanowire Transistors
- Atomic Layer Deposition
- Process Variation
- High-k Dielectrics
- Tunnel Field-Effect Transistors
- Integrated Circuits
- Ferroelectricity
- Reliability
- Low-Power
- Nanowire
- ESD Protection
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 18 words, with their numbers
- Process Variation732 topics
- Atomic Layer Deposition671 topic
- High-k Dielectrics671 topic
- Nanowire Transistors671 topic
- Tunnel Field-Effect Transistors671 topic
- Failure Analysis241 topic
- Integrated Circuits241 topic
- CMOS Technology102 topics
- Ferroelectricity101 topic
- Hafnium Oxide101 topic
- Reliability91 topic
- Wide Bandgap Semiconductors91 topic
- Low-Power61 topic
- Nanosensors61 topic
- Nanowire61 topic
- VLSI Circuits61 topic
- ESD Protection41 topic
- SCR Devices41 topic
Where does K. Mistry work?
K. Mistry's main affiliation in the publication record is Intel (United States), United States.
How many publications and citations does K. Mistry have?
OpenAlex counts 74 works and 6,364 citations for K. Mistry, an h-index of 31, ranking #258,278 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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