Lior Huli
Lior Huli publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering, on topics such as Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis and Electron and X-Ray Spectroscopy Techniques.
- World rank
- #7,306,272 of 7,710,434 ranked researchers
- Rank in United States
- #1,599,520 of 1,627,098
- Works
- 53
- Citations
- 351
- Citations per work
- 6.6
What does Lior Huli research?
Lior Huli's work is mostly in Engineering (75%), Materials Science (22%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences5196.2%
- Engineering4074.6%
- Materials Science1121.6%
- Everything else23.8%
- 1Electrical and Electronic Engineering65% of their works
- 2Surfaces, Coatings and Films19% of their works
- 3Biomedical Engineering6% of their works
- 4Electronic, Optical and Magnetic Materials2% of their works
- 5Mechanics of Materials2% of their works
- 6Industrial and Manufacturing Engineering1% of their works
Research topics
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Electron and X-Ray Spectroscopy Techniques
- Semiconductor materials and devices
- Advanced Surface Polishing Techniques
- 3D IC and TSV technologies
- Optical Coatings and Gratings
- Copper Interconnects and Reliability
Which keywords describe Lior Huli's research?
The keywords of their largest research topics: Nanofabrication, Electron Beam Lithography, Resolution Limits, Failure Analysis, Integrated Circuits, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy and Atomic Layer Deposition.
- Low-k Dielectrics
- Nanostructures
- Antireflective Coatings
- Chemical Mechanical Planarization
- Atomic Layer Deposition
- Scanning Electron Microscopy
- Failure Analysis
- Electron Beam Lithography
- Nanofabrication
- Resolution Limits
- Integrated Circuits
- X-ray Photoelectron Spectroscopy
- High-k Dielectrics
- Material Removal Mechanism
- Interconnect
- Through-Silicon Via
- Microelectronics
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 17 words, with their numbers
- Nanofabrication522 topics
- Electron Beam Lithography471 topic
- Resolution Limits471 topic
- Failure Analysis341 topic
- Integrated Circuits341 topic
- Scanning Electron Microscopy251 topic
- X-ray Photoelectron Spectroscopy251 topic
- Atomic Layer Deposition111 topic
- High-k Dielectrics111 topic
- Chemical Mechanical Planarization71 topic
- Material Removal Mechanism71 topic
- Antireflective Coatings51 topic
- Interconnect51 topic
- Nanostructures51 topic
- Through-Silicon Via51 topic
- Low-k Dielectrics41 topic
- Microelectronics41 topic
Where does Lior Huli work?
Lior Huli's main affiliation in the publication record is In-Q-Tel, United States.
How many publications and citations does Lior Huli have?
OpenAlex counts 53 works and 351 citations for Lior Huli, an h-index of 9, ranking #7,306,272 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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